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Inventor

Sachiko Ishikita

Inventor
Tokyo, JP

Overview

2→
Patents
1996–1997
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
Y10TTechnical subjects covered by former us classification33%
PatentTitleYear
5,604,060'Halftone phase shift photomask comprising a single layer of halftone light blocking and phase shifting'19975,561,009'Blanks for phase shift photomasks, and phase shift photomasks'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–1997Patents assigned to DAINIPPON PRINTING CO LTD (2)· patent assignee history
1996–1997Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAINIPPON PRINTING CO LTD21996–1997
Locations
LocationPatentsSpan
Tokyo, JP21996–1997