Inventor

RAYMOND WILHELMUS LOUIS LAFARRE

Inventor
NL

Overview

11→
Patents
2022–2026
Patent span
Performing operations
Primary field (CPC B)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
B05DProcesses for applying fluent materials to surfaces, in general11%
B22FWorking metallic powder11%
B23KSoldering or unsoldering11%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling11%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering11%
Y02PClimate change mitigation technologies in the production or processing of goods11%
H01LSemiconductor devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
C23CCoating metallic material3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to ASML NETHERLANDS BV (11)· patent assignee history
2022Patents assigned to ASML HOLDING NV (1)· patent assignee history
2022–2026Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV112022–2026
ASML HOLDING NV12022
Locations
LocationPatentsSpan
NL112022–2026