Inventor

Shinya Yamada

Inventor
Fuji, JP

Overview

57→
Patents
1998–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 57 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Kprimary
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients10%
C08LCompositions of macromolecular compounds10%
C07CAcyclic or carbocyclic compounds5%
C07DHeterocyclic compounds4%
G06FElectric digital data processing4%
H04LTransmission of digital information, e.g. telegraphic communication4%
C07BGeneral methods of organic chemistry3%
A61BDiagnosis3%
A61KPreparations for medical, dental or toiletry purposes3%
A61MDevices for introducing media into, or onto, the body3%
PatentTitleYear
11,134,596Work machine202110,893,6761-acetyl-3-phenyl urea compound, and use thereof202110,844,0191-phenyl-3-carbamoyl urea compound, and use thereof202010,655,007Polyalkylene terephthalate resin composition202010,639,823Microneedle-array manufacturing apparatus, microneedle-array manufacturing method, and product having the microneedle array202010,624,343Phenyl urea compound, and use thereof202010,577,498Polybutylene terephthalate resin composition202010,526,482Polybutylene terephthalate resin composition202010,442,821Method for releasing unsaturated aldehyde or ketone201910,233,040Sheet conveying device including dust proof cover, and image recording apparatus provided with same20199,985,780Hash value generating device that performs round processing of a hash algorithm20189,973,336Hash value generating device20189,957,375Resin composition20189,937,336Method of manufacturing a conical-projections-sheet packaging body20189,919,856'Microneedle-sheet packaging body and method of manufacturing the same'20189,875,362Hash value generation apparatus20189,852,881Scanning electron microscope system, pattern measurement method using same, and scanning electron microscope20179,614,667'Information processing apparatus and method therefor'20179,566,423'Transdermal patch manufacturing method and transdemal patch'20179,522,987'Polybutylene terephthalate resin composition and hydrolysis resistance-improving agent'20169,499,682'Polybutylene terephthalate resin composition and thin molded article'20169,191,628'Pattern dimension measurement method, pattern dimension measurement device, program for causing computer to execute pattern dimension measurement method, and recording medium having same recorded thereon'20159,114,459'Machine tool'20159,061,959'Method for manufacturing optically active menthol'20159,000,192'Catalyst for asymmetric hydrogenation and method for manufacturing optically active carbonyl compound using the same'20158,903,469'Determining velocity of cerebrospinal fluid by magnetic resonance imaging'20148,903,470'Determining velocity of cerebrospinal fluid by magnetic resonance imaging'20148,674,144'Catalyst for asymmetric hydrogenation and method for manufacturing optically active carbonyl compound using the same'20148,111,412'Printer, printing method and printing program for compensating for a loss of a part of a received image'20128,085,040'Magnetic resonance imaging apparatus and magnetic resonance imaging method'20117,880,464'Magnetic resonance imaging apparatus and magnetic resonance imaging method'20117,710,400'Touch panel having a transparent insulation film resistant to peel-off'20107,612,131'Flame-retardant resin composition'20097,554,624'Electronic device with protection panel, protection panel, and method of fabricating protection panels'20097,498,368'Flame-retardant resin composition'20097,498,375'Flame-retardant resin composition'20097,491,887'Foaming resin composition, foam using the same and coaxial insulated cable'20097,411,013'Flame-retardant resin composition'20087,268,770'Liquid crystal display of touch input type, and method of manufacture'20077,205,345'Flame-retardant resin composition'20077,169,836'Flame-retardant resin composition'20077,115,677'Flame-retardant resin composition'20067,087,704'Method for manufacturing thermotropic liquid-crystalline polymer'20066,805,920'Polymerizable liquid crystal compound and optical film'20046,790,886'Flame-retardant resin composition'20046,723,813'Method of preparing an acrylic copolymer having an acid anhydride group'20046,570,035'Process for producing pivaloyl-acetic acid ester'20036,559,902'Touch panel'20036,489,522'Process for producing optically active 3,7-dimethyl-6-octenol and process for producing intermediate therefor'20026,486,353'Process for producing optically active 3,7-dimethyl-6-octenol and process for producing intermediate therefor'20026,397,366'Data transmission system, data recording and reproducing apparatus and recording medium each having data structure of error correcting code'20026,194,491'Biphenyl epoxy resin, naphthalene-containing phenolic resin and accelerator triphenylphosphine/p-benzoquinone'20016,089,154'Thin film forming device'20005,978,958'Data transmission system, data recording and reproducing apparatus and recording medium each having data structure of error correcting code'19995,965,059'Optically active compound, antiferroelectric liquid crystal composition containing the same, process for producing the same and process for producing an optically active carboxylic acid'19995,820,782'Optically active compound and antiferroelectric liquid crystal composition containing the same'19985,757,327'Antenna unit for use in navigation system'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2019Patents assigned to TAKASAGO PERFUMERY CO LTD (10)· patent assignee history
1998–2019Based in Kanagawa, JP· patent location history
2000–2020Patents assigned to NISSHA PRINTING (9)· patent assignee history
2000–2020Based in Kyoto, JP· patent location history
2004–2020Patents assigned to POLYPLASTICS CO (11)· patent assignee history
2004–2020Based in Fuji, JP· patent location history
2009–2020Patents assigned to WINTECH POLYMER LTD (6)· patent assignee history
2011–2015Patents assigned to YAMADA SHINYA (9)· patent assignee history
2011–2014Based in Naka-gun, JP· patent location history
2017–2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
POLYPLASTICS CO112004–2020
TAKASAGO PERFUMERY CO LTD101998–2019
NISSHA PRINTING92000–2020
YAMADA SHINYAself92011–2015
WINTECH POLYMER LTD62009–2020
Locations
LocationPatentsSpan
Fuji, JP152004–2020
Kanagawa, JP111998–2019
Kyoto, JP92000–2020
Tokyo, JP82017–2021
Naka-gun, JP32011–2014