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Inventor

Teturyo Kusunoki

Inventor
Kanagawa, JP

Overview

2→
Patents
1994–1999
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
5,912,102'Positive resist composition'19995,376,497'Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–1999Patents assigned to NIPPON ZEON CO (2)· patent assignee history
1994–1999Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIPPON ZEON CO21994–1999
Locations
LocationPatentsSpan
Kanagawa, JP21994–1999