Inventor
Lily L. Pang
Inventor
Fremont, CA, US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01JElectric discharge tubes or discharge lamps11%
Y10TTechnical subjects covered by former us classification9%
C30BSingle-crystal growth7%
B08BCleaning in general5%
C25DProcesses for the electrolytic or electrophoretic production of coatings5%
A23DEdible oils or fats, e.g. margarines, shortenings or cooking oils2%
A23JProtein compositions for foodstuffs2%
F16LPipes2%
PatentTitleYear
9,303,318'Multiple complementary gas distribution assemblies'20168,568,529'HVPE chamber hardware'20138,491,720'HVPE precursor source hardware'20138,317,970'Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma'2012D0664172'Dome assembly for a deposition chamber'20128,183,132'Methods for fabricating group III nitride structures with a cluster tool'20127,691,755'Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor'20107,520,939'Integrated bevel clean chamber'20097,497,026'Method and system for detection of wafer centering in a track lithography tool'20097,285,195'Electric field reducing thrust plate'20077,223,323'Multi-chemistry plating system'20076,958,098'Semiconductor wafer support lift-pin assembly'20056,572,708'Semiconductor wafer support lift-pin assembly'20036,517,634'Chemical vapor deposition chamber lid assembly'20036,486,081'Gas distribution system for a CVD processing chamber'20026,450,117'Directing a flow of gas in a substrate processing chamber'20026,364,958'Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges'20026,363,624'Apparatus for cleaning a semiconductor process chamber'20026,143,078'Gas distribution system for a CVD processing chamber'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2016Patents assigned to APPLIED MATERIALS INC (18)· patent assignee history
2000–2016Based in Fremont, CA, US· patent location history
2012–2013Patents assigned to CHANG ANZHONG (4)· patent assignee history
2012–2013Patents assigned to ISHIKAWA TETSUYA (4)· patent assignee history
2012–2013Patents assigned to KRYLIOUK OLGA (4)· patent assignee history
2012–2013Patents assigned to MELNIK YURIY (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 18 | 2000–2016 |
| CHANG ANZHONG | 4 | 2012–2013 |
| ISHIKAWA TETSUYA | 4 | 2012–2013 |
| KRYLIOUK OLGA | 4 | 2012–2013 |
| MELNIK YURIY | 4 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 19 | 2000–2016 |