Inventor

Hisanori Tansho

Inventor

Kiyosu, JP

Overview

2014–2020

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary

C09GPolishing compositions21%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%

C09KMaterials for miscellaneous applications, not provided for elsewhere17%

H01LSemiconductor devices17%

B24BMachines, devices, or processes for grinding or polishing14%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%

C08LCompositions of macromolecular compounds3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2014–2020Patents assigned to FUJIMI INC (6)· patent assignee history

2014Patents assigned to AKATSUKA TOMOHIKO (1)· patent assignee history

2014Patents assigned to FUKUDA KANAKO (1)· patent assignee history

2014Patents assigned to ISHIDA YASUTO (1)· patent assignee history

2014Patents assigned to KACHI YOSHIHIRO (1)· patent assignee history

2014Based in Gifu, JP· patent location history

2017–2020Based in Kiyosu, JP· patent location history

2019Based in Aichi, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations