Inventor
Jason G. Fung
Inventor
Santa Clara, CA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing24%
B24DTools for grinding, buffing or sharpening16%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering16%
B29CShaping or joining of plastics12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B29LIndexing scheme associated with subclass b29c, relating to particular articles7%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts6%
C09GPolishing compositions5%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
H01LSemiconductor devices1%
PatentTitleYear
11,059,149Correction of fabricated shapes in additive manufacturing using initial layer202110,953,515Apparatus and method of forming a polishing pads by use of an additive manufacturing process202110,882,160Correction of fabricated shapes in additive manufacturing using sacrificial material202110,875,145Polishing pads produced by an additive manufacturing process202010,821,573Polishing pads produced by an additive manufacturing process202010,593,574Techniques for combining CMP process tracking data with 3D printed CMP consumables202010,589,399Textured small pad for chemical mechanical polishing202010,537,973Correction of fabricated shapes in additive manufacturing202010,537,974CMP pad construction with composite material properties using additive manufacturing processes202010,493,691Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles201910,399,201Advanced polishing pads having compositional gradients by use of an additive manufacturing process201910,391,605Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process201910,384,330Polishing pads produced by an additive manufacturing process201910,076,817Orbital polishing with small pad20189,873,180CMP pad construction with composite material properties using additive manufacturing processes20189,776,361'Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles'20179,308,623'Multi-disk chemical mechanical polishing pad conditioners and methods'20169,138,860'Closed-loop control for improved polishing pad profiles'20159,017,138'Retaining ring monitoring and control of pressure'20158,337,279'Closed-loop control for effective pad conditioning'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2021Patents assigned to APPLIED MATERIALS INC (20)· patent assignee history
2012–2015Patents assigned to CHANG SHOU-SUNG (2)· patent assignee history
2012–2015Patents assigned to COCCA CHRISTOPHER D (2)· patent assignee history
2012–2015Patents assigned to DHANDAPANI SIVAKUMAR (2)· patent assignee history
2012–2015Patents assigned to GARRETSON CHARLES C (2)· patent assignee history
2012–2017Based in Sunnyvale, CA, US· patent location history
2018–2021Based in Santa Clara, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 20 | 2012–2021 |
| CHANG SHOU-SUNG | 2 | 2012–2015 |
| COCCA CHRISTOPHER D | 2 | 2012–2015 |
| DHANDAPANI SIVAKUMAR | 2 | 2012–2015 |
| GARRETSON CHARLES C | 2 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Santa Clara, California, US | 15 | 2018–2021 |
| Sunnyvale, California, US | 5 | 2012–2017 |