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Inventor

Kazuyuki Miyazawa

Inventor
Yokohama, JP

Overview

25→
Patents
2000–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A61Kprimary
A61KPreparations for medical, dental or toiletry purposes14%
A61QSpecific use of cosmetics or similar toiletry preparations14%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium9%
C08JWorking-up7%
C09KMaterials for miscellaneous applications, not provided for elsewhere7%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
A61FFilters implantable into blood vessels3%
C08LCompositions of macromolecular compounds3%
G02BOptical elements, systems or apparatus3%
PatentTitleYear
10,945,942Starting material for cosmetics202110,758,471Copolymer and oily gelling agent202010,639,268Oily cosmetic202010,624,831Cosmetic20208,673,151'Method of modifying surface of material'20148,551,332'Affinity particle and affinity separation method'20138,426,627'Phosphorylcholine group-containing compound and surface modifying agent composed of such compound'20138,367,082'Microgel and external compositions containing the same'20138,318,865'Eye lens material and method of manufacturing thereof'20128,277,834'Method for producing protein adsorption-preventing ocular lens material'20128,269,031'Phosphorylcholine group-containing compound, method of manufacturing a phosphorylcholine group-containing compound, surface-modifying agent, and a method of modifying a surface using a surface-modifying agent'20128,257,776'Surface modification method and surface modified material'20128,242,222'Polysiloxane, acrylic compound and vinylic compound'20128,236,873'Method of manufacturing protein adsorption preventing eye lens material'20128,222,442'Phosphorylcholine group-containing compound, method of manufacturing a phosphorylcholine group-containing compound, surface-modifying agent, and a method of modifying a surface using a surface-modifying agent'20128,222,443'Phosphorylcholine group-containing compound, method of manufacturing a phosphorylcholine group-containing compound, surface-modifying agent, and a method of modifying a surface using a surface-modifying agent'20127,906,670'Phosphorylcholine group containing compound and surface modifying agent composed of such compound'20117,875,692'Polysiloxane having phosphorylcholine group and process for producing the same'20117,674,782'Phosphorylcholine group-containing compound and method for producing same'20107,560,023'Method of modifying surface of material'20097,348,424'Polysaccharide containing phosphorylcholine group and process for producing the same'20086,391,288'Microcapsule and method of making the same'20026,326,011'Copolymer containing reactive silyl groups, composition containing the same and method of treatment with the same'20016,127,431'Protein removed .beta.-1,3 glucan and coupling medium for probe of ultrasonograph containing same'20006,083,987'Phenylenediamine derivative, radical scavenger, brain-infarction depressant, and brain-edema depressant'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2021Patents assigned to SHISEIDO CO LTD (25)· patent assignee history
2000–2021Based in Yokohama, JP· patent location history
2000–2012Based in Kanagawa, JP· patent location history
2012–2014Patents assigned to MIYAZAWA KAZUYUKI (12)· patent assignee history
2012–2013Patents assigned to SUDA YUKIMITSU (8)· patent assignee history
2012–2013Patents assigned to ISHIHARA KAZUHIKO (4)· patent assignee history
2013–2014Patents assigned to KANDA TAKETOSHI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHISEIDO CO LTD252000–2021
MIYAZAWA KAZUYUKIself122012–2014
SUDA YUKIMITSU82012–2013
ISHIHARA KAZUHIKO42012–2013
KANDA TAKETOSHI22013–2014
Locations
LocationPatentsSpan
Yokohama, JP212000–2021
Kanagawa, JP42000–2012