LexDanaLexDanabeta
Inventor

Jean-Philippe Xavier Van Damme

Inventor
Wezembeek-Oppem, BE

Overview

2→
Patents
2021
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
11,036,148Patterning device cooling system and method of thermally conditioning a patterning device202110,908,517Setpoint generator, lithographic apparatus, lithographic apparatus operating method, and device manufacturing method2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2021Based in Wezembeek-Oppem, BE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22021
Locations
LocationPatentsSpan
Wezembeek-Oppem, BE22021