LexDanaLexDanabeta
Inventor

SHIH-CHI LIN

Inventor
TW

Overview

4→
Patents
2022–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10DInorganic electric semiconductor devices17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
B24BMachines, devices, or processes for grinding or polishing8%
G06FElectric digital data processing8%
PatentTitleYear
12,300,549Gate stack treatment202512,079,414Method for driving touch panel and related touch control circuit202411,670,553Gate stack treatment202311,358,252Method of using a polishing system2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (3)· patent assignee history
2022–2025Based in TW· patent location history
2024Patents assigned to NOVATEK MICROELECTRONICS CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD32022–2025
NOVATEK MICROELECTRONICS CORP12024
Locations
LocationPatentsSpan
TW42022–2025