Inventor
Birgit Enkisch
Inventor
Aalen, DE
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
B24BMachines, devices, or processes for grinding or polishing8%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them8%
PatentTitleYear
7,672,044'Lens made of a crystalline material'20107,411,656'Optically polarizing retardation arrangement, and a microlithography projection exposure machine'20087,382,536'Objective with fluoride crystal lenses'20087,292,388'Lens made of a crystalline material'20077,180,667'Objective with fluoride crystal lenses'20077,145,720'Objective with fluoride crystal lenses'20067,126,765'Objective with fluoride crystal lenses'20067,053,988'Optically polarizing retardation arrangement, and microlithography projection exposure machine'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2010Patents assigned to ZEISS CARL SMT AG (8)· patent assignee history
2006–2010Based in Aalen, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT AG | 8 | 2006–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 8 | 2006–2010 |