Inventor
Ramanathan Srinivasan
Inventor
Penn Yan, NY, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Gprimary
C09GPolishing compositions37%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1037%
C09KMaterials for miscellaneous applications, not provided for elsewhere26%
PatentTitleYear
7,101,800'Chemical-mechanical polishing slurry and method'20067,091,164'Slurry for chemical mechanical polishing silicon dioxide'20066,702,954'Chemical-mechanical polishing slurry and method'20046,627,107'Slurry for chemical mechanical polishing silicon dioxide'20036,544,892'Slurry for chemical mechanical polishing silicon dioxide'20036,491,843'Slurry for chemical mechanical polishing silicon dioxide'20026,468,910'Slurry for chemical mechanical polishing silicon dioxide'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2003Patents assigned to EASTMAN KODAK CO (3)· patent assignee history
2002–2006Patents assigned to FERRO CORP (3)· patent assignee history
2002–2006Patents assigned to UNIV CLARKSON (2)· patent assignee history
2002–2006Based in Penn Yan, NY, US· patent location history
2004–2006Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 3 | 2002–2003 |
| FERRO CORP | 3 | 2002–2006 |
| UNIV CLARKSON | 2 | 2002–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Penn Yan, New York, US | 5 | 2002–2006 |
| San Jose, California, US | 2 | 2004–2006 |