Inventor

Takamitsu Tomiga

Inventor
Shizuoka, JP

Overview

5→
Patents
2011–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
C08LCompositions of macromolecular compounds12%
C09GPolishing compositions12%
C09KMaterials for miscellaneous applications, not provided for elsewhere12%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
H01LSemiconductor devices6%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2021Patents assigned to FUJIFILM CORP (5)· patent assignee history
2011–2015Patents assigned to TOMIGA TAKAMITSU (4)· patent assignee history
2011–2015Patents assigned to INABA TADASHI (2)· patent assignee history
2011–2013Based in Haibara-gun, JP· patent location history
2013–2014Patents assigned to FUJII KANA (2)· patent assignee history
2013–2014Patents assigned to FUJIMORI TORU (2)· patent assignee history
2014–2021Based in Shizuoka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJIFILM CORP52011–2021
TOMIGA TAKAMITSUself42011–2015
FUJII KANA22013–2014
FUJIMORI TORU22013–2014
INABA TADASHI22011–2015
Locations
LocationPatentsSpan
Shizuoka, JP32014–2021
Haibara-gun, JP22011–2013