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Inventor

Yoshikazu Nozaki

Inventor
Palo Alto, CA, US

Overview

4→
Patents
2007–2010
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps40%
C23CCoating metallic material20%
H04LTransmission of digital information, e.g. telegraphic communication20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
7,849,815'Plasma processing apparatus'20107,457,238'Transmission system with congestion state-based flow control'20087,164,571'Wafer stage with a magnet'20077,159,537'Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007Patents assigned to ANELVA CORP (2)· patent assignee history
2007Based in Palo Alto, CA, US· patent location history
2008Patents assigned to FUJITSU LTD (1)· patent assignee history
2008Based in Yokohama, JP· patent location history
2010Patents assigned to CANON ANELVA CORP (1)· patent assignee history
2010Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ANELVA CORP22007
CANON ANELVA CORP12010
FUJITSU LTD12008
Locations
LocationPatentsSpan
Palo Alto, California, US22007
Tokyo, JP12010
Yokohama, JP12008