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Inventor

Syuji Fujii

Inventor
Takaoka, JP

Overview

4→
Patents
2001–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H03Hprimary
H03HImpedance networks, e.g. resonant circuits17%
H10NElectric solid-state devices not otherwise provided for17%
Y10TTechnical subjects covered by former us classification17%
B01DSeparation8%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry8%
C08JWorking-up8%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C09JAdhesives8%
PatentTitleYear
10,814,309Denitration catalyst and denitration device202010,030,179Granular adhesive agent20186,604,267'Method for manufacturing a piezoelectric device'20036,313,569'Piezoelectric device and method for manufacturing the same'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to MURATA MANUFACTURING CO (2)· patent assignee history
2001–2003Based in Takaoka, JP· patent location history
2018Patents assigned to SUMITOMO CHEMICAL CO (1)· patent assignee history
2018Based in Osaka, JP· patent location history
2020Patents assigned to MITSUBISHI HEAVY IND LTD (1)· patent assignee history
2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MURATA MANUFACTURING CO22001–2003
MITSUBISHI HEAVY IND LTD12020
SUMITOMO CHEMICAL CO12018
Locations
LocationPatentsSpan
Takaoka, JP22001–2003
Tokyo, JP12020
Osaka, JP12018