Inventor
Masaya Hisamatsu
Inventor
Kawasaki, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C25Fprimary
C25FProcesses for the electrolytic removal of materials from objects29%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation21%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
Y02PClimate change mitigation technologies in the production or processing of goods14%
PatentTitleYear
6,491,808'Electrolytic etching method, method for producing photovoltaic element, and method for treating defect of photovoltaic element'20026,051,116'Etching apparatus'20005,993,637'Electrode structure, electrolytic etching process and apparatus'19995,863,412'Etching method and process for producing a semiconductor element using said etching method'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2002Patents assigned to CANON KK (4)· patent assignee history
1999–2002Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 4 | 1999–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 4 | 1999–2002 |