Inventor
Amy Jasek
Inventor
Rochester, NY, US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Cprimary
G03CPhotosensitive materials for photographic purposes44%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests38%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
G02BOptical elements, systems or apparatus6%
Y10TTechnical subjects covered by former us classification6%
PatentTitleYear
7,934,830'High water content silicone hydrogels'20116,524,777'Method of activating a protective layer on a photographic element employing an organic solvent in the wash solution'20036,406,838'Protective overcoat for an imaging element comprising an enzyme-treated biopolymer'20026,280,912'Protective overcoat for an imaging element comprising an enzyme-treated biopolymer'20016,258,520'Hydrolyzed water-resistant protective overcoat for an imaging element'20016,190,843'Hydrolyzed water-resistant protective overcoat for an imaging element'20016,187,517'Enzyme-activated water-resistant protective overcoat for a photographic element'20015,853,926'Pre-coated, fused plastic particles as a protective overcoat for color photographic prints'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2003Patents assigned to EASTMAN KODAK CO (7)· patent assignee history
1998–2011Based in Rochester, NY, US· patent location history
2011Patents assigned to BAUSCH & LOMB (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 7 | 1998–2003 |
| BAUSCH & LOMB | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rochester, New York, US | 8 | 1998–2011 |