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Inventor

Sven Pekelder

Inventor
Son en Breugel, NL

Overview

5→
Patents
2014–2021
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
B41JTypewriters13%
C23CCoating metallic material13%
G01BMeasuring length, thickness or similar linear dimensions13%
G01DMeasuring not specially adapted for a specific variable13%
H05GX-ray technique13%
PatentTitleYear
11,014,386Actuation mechanism for accurately controlling distance in OVJP printing202110,634,523Optical rotation angle measuring system20209,091,944'Source collector, lithographic apparatus and device manufacturing method'20158,970,818'Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient'20158,917,380'Lithographic apparatus and method'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2015Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2014–2015Patents assigned to PEKELDER SVEN (3)· patent assignee history
2014–2015Patents assigned to LOOPSTRA ERIK ROELOF (2)· patent assignee history
2014–2015Patents assigned to NIENHUYS HAN-KWANG (2)· patent assignee history
2014–2020Based in Son en Breugel, NL· patent location history
2020Patents assigned to ARGES GMBH (1)· patent assignee history
2021Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32014–2015
PEKELDER SVENself32014–2015
LOOPSTRA ERIK ROELOF22014–2015
NIENHUYS HAN-KWANG22014–2015
ARGES GMBH12020
Locations
LocationPatentsSpan
Son en Breugel, NL42014–2020
Eindhoven, NL12021