Inventor
No Jin Park
Inventor
Daejeon, KR
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
C08JWorking-up9%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
B82YSpecific uses or applications of nanostructures8%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems8%
C08LCompositions of macromolecular compounds7%
C07CAcyclic or carbocyclic compounds6%
C07DHeterocyclic compounds5%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
PatentTitleYear
11,111,331Block copolymer containing photo-sensitive moiety202111,078,318Block copolymer202111,059,947Method for producing polymer film202111,028,201Polymer composition202111,027,532Laminate202110,633,533Block copolymer202010,532,546Composite for neutral layer202010,370,529Method of manufacturing patterned substrate201910,310,378Block copolymer201910,295,908Block copolymer201910,287,430Method of manufacturing patterned substrate201910,287,429Block copolymer201910,281,820Block copolymer201910,239,980Block copolymer201910,240,035Block copolymer201910,227,438Block copolymer201910,227,437Block copolymer201910,227,436Block copolymer201910,202,481Block copolymer201910,202,480Block copolymer201910,196,475Block copolymer201910,196,474Block copolymer201910,184,021Block copolymer201910,160,822Monomer and block copolymer201810,153,173Method for wet etching of block copolymer self-assembly pattern201810,150,832Block copolymer201810,087,276Block copolymer201810,081,698Block copolymer20188,191,512'Structure of heat exchange apparatus for gas boiler'20126,316,869'Shadow mask in color CRT'20016,285,120'Shadow mask of cathode ray tube and manufacturing method thereof'20016,229,255'Shadow mask in color CRT having specific materials'20016,130,500'Doming effect resistant shadow mask for cathode ray tube and its fabricating method'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2001Patents assigned to LG ELECTRONICS INC (4)· patent assignee history
2000–2001Based in Kyungki-do, KR· patent location history
2012Patents assigned to DAESUNG IND CORP (1)· patent assignee history
2012Patents assigned to PARK NO JIN (1)· patent assignee history
2012Based in Chungcheongbuk-do, KR· patent location history
2018–2021Patents assigned to LG CHEMICAL LTD (28)· patent assignee history
2018–2021Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LG CHEMICAL LTD | 28 | 2018–2021 |
| LG ELECTRONICS INC | 4 | 2000–2001 |
| DAESUNG IND CORP | 1 | 2012 |
| PARK NO JINself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 28 | 2018–2021 |
| Kyungki-do, KR | 4 | 2000–2001 |
| Chungcheongbuk-do, KR | 1 | 2012 |