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Inventor

Jin Wuk Sung

Inventor
Northborough, MA, US

Overview

19→
Patents
2007–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
C09DCoating compositions, e.g. paints, varnishes or lacquers14%
H01LSemiconductor devices12%
C07CAcyclic or carbocyclic compounds5%
C08LCompositions of macromolecular compounds4%
B05DProcesses for applying fluent materials to surfaces, in general3%
G03CPhotosensitive materials for photographic purposes3%
C07DHeterocyclic compounds2%
PatentTitleYear
10,703,917Coating compositions suitable for use with an overcoated photoresist202010,539,873Coating compositions suitable for use with an overcoated photoresist202010,133,179Pattern treatment methods201810,042,255Block copolymers and pattern treatment compositions and methods20189,910,355'Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom'20189,910,353'Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom'20189,726,977'Coating compositions suitable for use with an overcoated photoresist'20179,708,493'Coating compositions suitable for use with an overcoated photoresist'20179,703,203'Compositions and methods for pattern treatment'20179,684,241'Compositions and methods for pattern treatment'20179,671,697'Pattern treatment methods'20179,665,005'Pattern treatment methods'20179,499,513'Acid generators and photoresists comprising same'20169,448,483'Pattern shrink methods'20168,945,814'Acid generators and photoresists comprising same'20158,940,472'Coating compositions suitable for use with an overcoated photoresist'20158,883,407'Coating compositions suitable for use with an overcoated photoresist'20147,326,518'Photoresist compositions'20087,297,616'Methods, photoresists and substrates for ion-implant lithography'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2020Patents assigned to ROHM & HAAS ELECT MAT (17)· patent assignee history
2007–2020Based in Worcester, MA, US· patent location history
2008–2018Based in Northborough, MA, US· patent location history
2014–2017Patents assigned to AMARA JOHN P (3)· patent assignee history
2014–2017Patents assigned to CAMERON JAMES F (3)· patent assignee history
2014–2017Patents assigned to SUNG JIN WUK (3)· patent assignee history
2016–2018Patents assigned to DOW GLOBAL TECHNOLOGIES LLC (9)· patent assignee history
2018Based in Marlborough, MA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ROHM & HAAS ELECT MAT172007–2020
DOW GLOBAL TECHNOLOGIES LLC92016–2018
AMARA JOHN P32014–2017
CAMERON JAMES F32014–2017
SUNG JIN WUKself32014–2017
Locations
LocationPatentsSpan
Northborough, Massachusetts, US112008–2018
Worcester, Massachusetts, US62007–2020
Marlborough, Massachusetts, US22018