Inventor
Kanji Tsujii
Inventor
Nishitama-gun, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material31%
C23FNon-mechanical removal of metallic material from surface15%
G01RMeasuring electric variables15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H01JElectric discharge tubes or discharge lamps8%
PatentTitleYear
5,140,272'Method of semiconductor surface measurment and an apparatus for realizing the same'19924,936,252'Equipment for manufacturing semiconductor devices'19904,887,037'Electron spin resonance spectrometer'19894,716,852'Apparatus for thin film formation using photo-induced chemical reaction'19884,678,536'Method of photochemical surface treatment'19874,653,908'Grazing incidence reflection spectrometer'19874,643,799'Method of dry etching'19874,615,756'Dry etching apparatus'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–1992Patents assigned to HITACHI LTD (8)· patent assignee history
1986–1990Based in Nishitama-gun, JP· patent location history
1987–1992Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 8 | 1986–1992 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nishitama-gun, JP | 5 | 1986–1990 |
| Tokyo, JP | 3 | 1987–1992 |