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Inventor

Eri Haikatak

Inventor
Fuchu, JP

Overview

3→
Patents
1999–2001
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
6,194,680'Microwave plasma processing method'20016,005,217'Microwave plasma processing method for preventing the production of etch residue'19995,925,265'Microwave plasma processing method for preventing the production of etch residue'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2001Patents assigned to HITACHI LTD (3)· patent assignee history
1999–2001Based in Fuchu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD31999–2001
Locations
LocationPatentsSpan
Fuchu, JP31999–2001