Inventor

Takahiro Kishioka

Inventor

Toyama, JP

Overview

2005–2021

Patent span

Chemistry

Primary field (CPC C)

Patents· 49 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%

C09DCoating compositions, e.g. paints, varnishes or lacquers8%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%

C08LCompositions of macromolecular compounds6%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%

H01LSemiconductor devices4%

G02BOptical elements, systems or apparatus3%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%

PatentTitleYear

11,131,928Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive2021 11,112,696Protective film-forming composition2021 11,003,078Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method2021 10,844,255Photosensitive adhesive composition2020 10,844,167Composition for forming resist underlayer film and method for forming resist pattern using same2020 10,804,111Method for roughening surface using wet treatment2020 10,774,234Cell culture vessel2020 10,724,028Ligand-binding fiber and cell culture substrate using said fiber2020 10,684,546Composition for forming resist underlayer film2020 10,437,151Cationically polymerizable resist underlayer film-forming composition2019 10,240,122Active-ester-group-containing composition for producing fibers, and cell culture scaffold material using fibers produced from active-ester-group-containing composition2019 10,222,697Photosensitive fiber and method for manufacturing same2019 10,202,528Polymer and composition including same, and adhesive composition2019 10,092,687Blood filter and method for manufacturing the same2018 9,957,644Fiber-forming composition and bio-compatible material using said fiber2018 9,822,330'Light-degradable material, substrate, and method for patterning the substrate'2017 9,678,427'Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain'2017 9,524,871'Silicon-containing resist underlayer film-forming composition having sulfone structure'2016 9,436,085'Composition for forming photosensitive resist underlayer film'2016 9,348,222'Positive resist composition and method for production of microlens'2016 9,340,561'Organic silicon compound and silane coupling agent containing the same'2016 9,214,345'Film-forming composition and ion implantation method'2015 9,140,989'Photosensitive organic particles'2015 9,023,583'Monolayer or multilayer forming composition'2015 8,993,699'Photosensitive resin composition for microlens'2015 8,940,470'Photosensitive resin and process for producing microlens'2015 8,796,349'Photosensitive resin composition for microlenses'2014 8,710,491'Forming agent for gate insulating film of thin film transistor'2014 8,685,615'Photosensitive resist underlayer film forming composition'2014 8,674,043'Photosensitive resin composition containing copolymer'2014 8,623,745'Composition for forming gate insulating film for thin-film transistor'2014 8,460,855'Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound'2013 8,445,175'Composition containing hydroxylated condensation resin for forming resist underlayer film'2013 8,436,339'Gate insulating film forming agent for thin-film transistor'2013 8,007,979'Acrylic polymer-containing gap fill material forming composition for lithography'2011 7,947,424'Composition for forming anti-reflective coat'2011 7,846,638'Composition for forming anti-reflective coating for use in lithography'2010 7,842,620'Method for manufacturing semiconductor device using quadruple-layer laminate'2010 7,816,067'Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative'2010 7,794,919'Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound'2010 7,790,356'Condensation type polymer-containing anti-reflective coating for semiconductor'2010 7,595,144'Sulfonate-containing anti-reflective coating forming composition for lithography'2009 7,501,229'Anti-reflective coating containing sulfur atom'2009 7,425,403'Composition for forming anti-reflective coating for use in lithography'2008 7,425,399'Composition for forming anti-reflective coating for use in lithography'2008 7,332,266'Composition for forming anti-reflective coating for use in lithography'2008 7,326,509'Composition for forming anti-reflective coating for use in lithography'2008 7,226,721'Underlayer coating forming composition for lithography containing compound having protected carboxyl group'2007 6,927,266'Bottom anti-reflective coat forming composition for lithography'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2020Patents assigned to NISSAN CHEMICAL IND LTD (43)· patent assignee history

2005–2016Based in Funabashi, JP· patent location history

2007–2021Based in Toyama, JP· patent location history

2008–2011Based in Nishikamo-gun, JP· patent location history

2013–2016Patents assigned to KISHIOKA TAKAHIRO (16)· patent assignee history

2014–2016Patents assigned to KIMURA SHIGEO (4)· patent assignee history

2014–2016Patents assigned to NISHIMAKI HIROKAZU (4)· patent assignee history

2020–2021Patents assigned to NISSAN CHEMICAL CORP (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NISSAN CHEMICAL IND LTD	43	2005–2020
KISHIOKA TAKAHIROself	16	2013–2016
NISSAN CHEMICAL CORP	5	2020–2021
KIMURA SHIGEO	4	2014–2016
NISHIMAKI HIROKAZU	4	2014–2016

Locations

Location	Patents	Span
Toyama, JP	39	2007–2021
Nishikamo-gun, JP	6	2008–2011
Funabashi, JP	4	2005–2016