Inventor
Alexander Marinus Arnoldus Huijberts
Inventor
Veghel, NL
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G21KHandling of particles or ionising radiation not otherwise provided for25%
PatentTitleYear
9,606,445'Lithographic apparatus and method of manufacturing a device'20178,970,818'Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient'20158,625,068'Lithographic apparatus configured to suppress contamination from passing into the projection system and method'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2017Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2014–2015Patents assigned to HUIJBERTS ALEXANDER MARINUS ARNOLDUS (2)· patent assignee history
2014–2015Patents assigned to NIENHUYS HAN-KWANG (2)· patent assignee history
2014–2017Based in Veghel, NL· patent location history
2015Patents assigned to GASSELING PAULUS ALBERTUS MARIA (1)· patent assignee history
2015Patents assigned to JANSSEN FRANCISCUS JOHANNES JOSEPH (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 3 | 2014–2017 |
| HUIJBERTS ALEXANDER MARINUS ARNOLDUSself | 2 | 2014–2015 |
| NIENHUYS HAN-KWANG | 2 | 2014–2015 |
| GASSELING PAULUS ALBERTUS MARIA | 1 | 2015 |
| JANSSEN FRANCISCUS JOHANNES JOSEPH | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veghel, NL | 3 | 2014–2017 |