Inventor
Ji Ding
Inventor
Shanghai, CN
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them14%
G06FElectric digital data processing14%
H01JElectric discharge tubes or discharge lamps14%
H04MTelephonic communication14%
H04WWireless communication networks9%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy5%
H04LTransmission of digital information, e.g. telegraphic communication5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
Y02TClimate change mitigation technologies related to transportation5%
PatentTitleYear
10,950,866Battery with active materials stored on or in carbon nanosheets202110,764,419Mobile terminal and method for starting shooting on mobile terminal202010,560,881Network handover method and apparatus202010,225,390Mobile terminal and method for starting shooting on mobile terminal20199,787,814'Mobile terminal and method for starting shooting on mobile terminal'20179,462,468'Wireless local area network authentication method and mobile terminal'20166,800,213'Precision dielectric etch using hexafluorobutadiene'20046,432,318'Dielectric etch process reducing striations and maintaining critical dimensions'20026,113,731'Magnetically-enhanced plasma chamber with non-uniform magnetic field'20006,076,482'Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion'20006,022,446'Shallow magnetic fields for generating circulating electrons to enhance plasma processing'20005,814,563'Method for etching dielectric using fluorohydrocarbon gas, NH.sub.3 -generating gas, and carbon-oxygen gas'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2002Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
1998–2000Based in Campbell, CA, US· patent location history
2000Based in Newark, CA, US· patent location history
2002–2004Based in Fremont, CA, US· patent location history
2016–2020Patents assigned to HUAWEI DEVICE CO LTD (3)· patent assignee history
2016–2020Based in Shanghai, CN· patent location history
2019Patents assigned to HUAWEI DEVICE DONGGUAN CO LTD (1)· patent assignee history
2020Patents assigned to HUAWEI TECH CO LTD (1)· patent assignee history
2021Patents assigned to SPARKLE POWER LLC (1)· patent assignee history
2021Based in Edmonton, CA· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 4 | 1998–2002 |
| HUAWEI DEVICE CO LTD | 3 | 2016–2020 |
| HUAWEI DEVICE DONGGUAN CO LTD | 1 | 2019 |
| HUAWEI TECH CO LTD | 1 | 2020 |
| SPARKLE POWER LLC | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shanghai, CN | 5 | 2016–2020 |
| Fremont, California, US | 2 | 2002–2004 |
| Newark, California, US | 2 | 2000 |
| Campbell, California, US | 2 | 1998–2000 |
| Edmonton, CA | 1 | 2021 |