Inventor

Saburo Nonogaki

Inventor

Tokyo, JP

Overview

34→

Patents

1978–1992

Patent span

Physics

Primary field (CPC G)

Patents· 34 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%

H01JElectric discharge tubes or discharge lamps23%

G03CPhotosensitive materials for photographic purposes12%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%

C07CAcyclic or carbocyclic compounds3%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%

C03CChemical composition of glasses, glazes or vitreous enamels1%

C07DHeterocyclic compounds1%

C08CTreatment or chemical modification of rubbers1%

PatentTitleYear

5,173,382'Photosensitive composition containing water-soluble binder and aromatic diazonium chromate forming fluorescent screens employing same'1992 5,081,394'Black matrix color picture tube'1992 5,024,920'Process for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymer'1991 4,985,344'Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer'1991 4,904,569'Method of forming pattern and projection aligner for carrying out the same'1990 4,857,429'Process of improving optical contact of patternwise powdery coating layer and phosphor screen provided therefore'1989 4,855,200'Fluorescent screens of color picture tubes and manufacturing method therefor'1989 4,815,821'Face plate for display'1989 4,773,740'Electrochromic display device'1988 4,735,880'Photosensitive composition and pattern forming process using same'1988 4,728,594'Photosensitive composition with azide or bisazide compound with oxazolone group'1988 4,614,706'Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching'1986 4,565,768'Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern'1986 4,564,572'Process for forming pattern'1986 4,537,851'Process of forming powder pattern using positive diazonium salt photoresist'1985 4,520,094'Process for forming powder pattern on light exposed layer having photosensitive diazonium salts'1985 4,510,226'Photosensitive composition and pattern forming process using same'1985 4,469,778'Pattern formation method utilizing deep UV radiation and bisazide composition'1984 4,465,768'Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate'1984 4,436,583'Selective etching method of polyimide type resin film'1984 4,409,313'Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine'1983 4,407,916'Process for forming fluorescent screen'1983 4,396,705'Pattern forming method and pattern forming apparatus using exposures in a liquid'1983 4,377,630'Photosensitive composition'1983 4,279,985'Photopolymer imaging using epoxy and bromine containing ethylenically unsaturated compounds'1981 4,276,363'Process for forming phosphor screens with treated phosphors'1981 4,273,842'Process for forming patternwise coated powder layer'1981 4,269,918'Process for forming patternwise coated powder layer'1981 4,247,612'Method of forming fluorescent screens of color picture tubes'1981 4,241,162'Light sensitive photoresist materials'1980 4,191,571'Method of pattern forming in a photosensitive composition having a reciprocity law failing property'1980 4,187,205'Radiation-sensitive composition'1980 4,101,440'Chemically digestive agents'1978 4,086,090'Formation of pattern using acrylamide-diacetoneacrylamide copolymer'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1992Patents assigned to HITACHI LTD (30)· patent assignee history

1978–1992Based in Tokyo, JP· patent location history

1980–1981Patents assigned to NIPPON TELEGRAPH & TELEPHONE (2)· patent assignee history

1984–1989Based in Meguro-ku, JP· patent location history

1986–1988Patents assigned to HITACHI CHEMICAL CO LTD (2)· patent assignee history

1986Based in Mobara, JP· patent location history

1988Patents assigned to HITACHI MAXELL (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI LTD	30	1978–1992
HITACHI CHEMICAL CO LTD	2	1986–1988
NIPPON TELEGRAPH & TELEPHONE	2	1980–1981
HITACHI MAXELL	1	1988

Locations

Location	Patents	Span
Tokyo, JP	30	1978–1992
Meguro-ku, JP	3	1984–1989
Mobara, JP	1	1986