Inventor

Ehud Tirosh

Inventor
Jerusalem, IL

Overview

21→
Patents
1996–2010
Patent span
Physics
Primary field (CPC G)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties46%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01JElectric discharge tubes or discharge lamps13%
H04NPictorial communication, e.g. television8%
G01RMeasuring electric variables4%
G06TImage data processing or generation, in general4%
PatentTitleYear
7,846,649'High resolution printer and a method for high resolution printing'20107,842,935'Raster frame beam system for electron beam lithography'20107,844,103'Microscopic inspection apparatus for reducing image smear using a pulsed light source and a linear-periodic superpositioned scanning scheme to provide extended pulse duration, and methods useful therefor'20107,826,049'Inspection tools supporting multiple operating states for multiple detector arrangements'20107,796,807'Optical inspection apparatus for substrate defect detection'20107,599,075'Automatic optical inspection using multiple objectives'20097,521,700'Raster frame beam system for electron beam lithography'20097,518,391'Probe card and a method for detecting defects using a probe card and an additional inspection'20097,499,583'Optical inspection method for substrate defect detection'20097,394,531'Apparatus and method for automatic optical inspection'20087,355,689'Automatic optical inspection using multiple objectives'20087,133,548'Method and apparatus for reticle inspection using aerial imaging'20067,098,468'Raster frame beam system for electron beam lithography'20066,952,491'Optical inspection apparatus for substrate defect detection'20056,268,093'Method for reticle inspection using aerial imaging'20016,178,257'Substrate inspection method and apparatus'20016,175,645'Optical inspection method and apparatus'20015,982,921'Optical inspection method and apparatus'19995,731,846'Method and system for perspectively distoring an image and implanting same into a video stream'19985,699,447'Two-phase optical inspection method and apparatus for defect detection'19975,491,517'System for implanting an image into a video stream'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–1998Based in Tel Aviv, IL· patent location history
1997Patents assigned to ORBOT INSTR LTD (1)· patent assignee history
1997–2010Based in Jerusalem, IL· patent location history
1998Patents assigned to SCIDEL TECHNOLOGIES LTD (1)· patent assignee history
1999–2008Patents assigned to APPLIED MATERIALS INC (9)· patent assignee history
2006–2010Based in Nes Ziona, IL· patent location history
2008–2010Based in Mevaseret Zion, IL· patent location history
2009–2010Patents assigned to APPLIED MATERIALS ISRAEL LTD (8)· patent assignee history
2010Patents assigned to APPLIED MATERIALS SOUTH EAST A (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC91999–2008
APPLIED MATERIALS ISRAEL LTD82009–2010
APPLIED MATERIALS SOUTH EAST A12010
ORBOT INSTR LTD11997
SCIDEL TECHNOLOGIES LTD11998
Locations
LocationPatentsSpan
Jerusalem, IL91997–2010
Mevaseret Zion, IL72008–2010
Nes Ziona, IL32006–2010
Tel Aviv, IL21996–1998