Inventor

Hengchang Bi

Inventor

Singapore, SG

Overview

2019–2020

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Jprimary

B01JChemical or physical processes, e.g. catalysis or colloid chemistry20%

C01BNon-metallic elements20%

C02FTreatment of water, waste water, sewage, or sludge20%

C09KMaterials for miscellaneous applications, not provided for elsewhere20%

C01GCompounds containing metals not covered by subclasses c01d or c01f10%

C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds10%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2019–2020Patents assigned to UNIV NANYANG TECH (2)· patent assignee history

2019–2020Based in Singapore, SG· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
UNIV NANYANG TECH	2	2019–2020

Locations

Location	Patents	Span
Singapore, SG	2	2019–2020