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Inventor

Matthias Langer

Inventor
Heubach-Lautern, DE

Overview

4→
Patents
2010–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps43%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
G06FElectric digital data processing14%
G21KHandling of particles or ionising radiation not otherwise provided for14%
H04NPictorial communication, e.g. television14%
PatentTitleYear
9,536,704'Method for avoiding artefacts during serial block face imaging'20178,519,355'Charged particle source'20138,471,203'Particle-beam microscope'20137,822,775'Method and system for managing complex database information'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010Patents assigned to SAP AG (1)· patent assignee history
2010Based in Malsch, DE· patent location history
2013–2017Patents assigned to ZEISS CARL MICROSCOPY GMBH (3)· patent assignee history
2013Patents assigned to BENNER GERD (1)· patent assignee history
2013Patents assigned to LANGER MATTHIAS (1)· patent assignee history
2013–2017Based in Heubach-Lautern, DE· patent location history
2013Based in Heubach, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL MICROSCOPY GMBH32013–2017
BENNER GERD12013
LANGER MATTHIASself12013
SAP AG12010
Locations
LocationPatentsSpan
Heubach-Lautern, DE22013–2017
Heubach, DE12013
Malsch, DE12010