Inventor
Takeshi Koshiba
Inventor
Yokohama, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures26%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
H01JElectric discharge tubes or discharge lamps13%
G06FElectric digital data processing10%
B05DProcesses for applying fluent materials to surfaces, in general6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G06TImage data processing or generation, in general3%
G10LSpeech analysis techniques or speech synthesis3%
H01LSemiconductor devices3%
H04LTransmission of digital information, e.g. telegraphic communication3%
PatentTitleYear
9,389,513'Method of forming pattern, system for calculating resist coating distribution and program for calculating the same'20169,381,540'Pattern forming method'20169,046,763'Pattern forming method'20158,907,346'Imprint apparatus, imprint method, and manufacturing method of semiconductor device'20148,423,926'Acceptance determining method of blank for EUV mask and manufacturing method of EUV mask'20138,178,366'Pattern forming method, manufacturing method of semiconductor device, and template manufacturing method'20127,985,958'Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program'20117,889,910'Character pattern extracting method, charged particle beam drawing method, and character pattern extracting program'20117,482,604'Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device'20097,459,705'Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device'20087,257,224'Cryptographical pseudo-random number generation apparatus and program'20076,330,539'Dialog interface system'20016,040,840'Virtual clay system and its method of simulation'20005,787,426'Data sorting, data sorting tree creating, derivative extracting and thesaurus creating apparatus and method, or data processing system'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2007Patents assigned to FUJITSU LTD (4)· patent assignee history
1998–2007Based in Kawasaki, JP· patent location history
2001Based in Kanagawa, JP· patent location history
2008–2016Patents assigned to TOSHIBA KK (10)· patent assignee history
2008–2016Based in Yokohama, JP· patent location history
2012–2016Patents assigned to KOSHIBA TAKESHI (4)· patent assignee history
2012–2013Patents assigned to MIYOSHI SEIRO (2)· patent assignee history
2012–2013Patents assigned to MUKAI HIDEFUMI (2)· patent assignee history
2012–2016Based in Mie, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 10 | 2008–2016 |
| FUJITSU LTD | 4 | 1998–2007 |
| KOSHIBA TAKESHIself | 4 | 2012–2016 |
| MIYOSHI SEIRO | 2 | 2012–2013 |
| MUKAI HIDEFUMI | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 6 | 2008–2016 |
| Mie, JP | 4 | 2012–2016 |
| Kawasaki, JP | 3 | 1998–2007 |
| Kanagawa, JP | 1 | 2001 |