Inventor
Johannes Baier
Inventor
Wuerselen, DE
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps38%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light19%
G01BMeasuring length, thickness or similar linear dimensions10%
B29BPreparation or pretreatment of the material to be shaped5%
B29CShaping or joining of plastics5%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts5%
C04BLime, magnesia5%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
F21VFunctional features or details of lighting devices or systems thereof5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
PatentTitleYear
10,502,547Laser sensor for self-mixing interferometry having a vertical external cavity surface emission laser (VECSEL) as the light source20199,789,631'System for and method of heating objects in a production line'20179,397,476'Laser sensor for self-mixing interferometry having a vertical external cavity surface emission laser (VECSEL) as the light source'20168,998,455'Method of manufacturing a part of a color ring and a part of a color ring'20158,045,594'Surface-emitting external cavity laser device'20117,733,027'High-pressure mercury vapor lamp incorporating a predetermined germanium to oxygen molar ratio within its discharge fill'20107,514,871'High-pressure gas-discharge lamp with improved temperature resistance'20097,414,367'Mercury free high-pressure metal halide discharge lamp'20087,391,154'Low-pressure gas discharge lamp with gas filling containing tin'20087,282,862'High-pressure discharge lamp with mercury chloride having a limited chlorine content'20076,972,521'Low-pressure gas discharge lamp having a mercury-free gas filling with an indium compound'20056,731,070'Low-pressure gas discharge lamp with a mercury-free gas filling'20046,603,267'Low-pressure gas discharge lamp with a copper-containing gas filling'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2011Patents assigned to KONINKL PHILIPS ELECTRONICS NV (9)· patent assignee history
2003–2019Based in Wuerselen, DE· patent location history
2007–2010Based in Würselen, DE· patent location history
2015–2017Patents assigned to BAIER JOHANNES (3)· patent assignee history
2015–2016Patents assigned to KONINKL PHILIPS NV (2)· patent assignee history
2015–2017Patents assigned to WEICHMANN ULRICH (2)· patent assignee history
2015Based in Eindhoven, NL· patent location history
2016–2017Patents assigned to MOENCH HOLGER (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KONINKL PHILIPS ELECTRONICS NV | 9 | 2003–2011 |
| BAIER JOHANNESself | 3 | 2015–2017 |
| KONINKL PHILIPS NV | 2 | 2015–2016 |
| MOENCH HOLGER | 2 | 2016–2017 |
| WEICHMANN ULRICH | 2 | 2015–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Wuerselen, DE | 7 | 2003–2019 |
| Würselen, DE | 5 | 2007–2010 |
| Eindhoven, NL | 1 | 2015 |