Inventor
Toshio Matsuura
Inventor
Tokyo, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices58%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
G03HHolographic processes or apparatus8%
B21KMaking forged or pressed metal products, e.g. horse-shoes, rivets, bolts or wheels3%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for3%
C06DMeans for generating smoke or mist3%
F42BExplosive charges, e.g. for blasting, fireworks, ammunition3%
G01BMeasuring length, thickness or similar linear dimensions3%
G01RMeasuring electric variables3%
G02BOptical elements, systems or apparatus3%
PatentTitleYear
9,079,808'Gas generator, gas generator holder and method for manufacturing gas generator holder'20157,876,118'Test equipment'20116,366,341'Exposure method and exposure apparatus'20025,995,199'Position measurement method for measuring a position of an exposure mask and exposure method for transferring an image of the pattern formed in an exposure mask'19995,985,496'Exposure method and apparatus'19995,973,766'Exposure method and exposure device'19995,912,726'Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system'19995,774,240'Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques'19985,617,211'Exposure apparatus'19975,528,390'Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques'19965,523,841'Distance measuring apparatus using multiple switched interferometers'19965,504,596'Exposure method and apparatus using holographic techniques'19965,442,418'Exposure method'19955,295,086'Method of producing noise free frequency spectrum signals'19944,801,208'Projection type exposing apparatus'1989RE032795'Exposure apparatus for production of integrated circuit'19884,734,746'Exposure method and system for photolithography'19884,723,221'Method for manufacturing semiconductor device and apparatus therefor'19884,702,606'Position detecting system'19874,699,515'Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween'19874,677,301'Alignment apparatus'19874,655,598'Position detection method and apparatus'19874,566,795'Alignment apparatus'19864,465,368'Exposure apparatus for production of integrated circuit'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–1988Patents assigned to NIPPON KOGAKU KK (8)· patent assignee history
1984–1988Based in Koshigaya, JP· patent location history
1988–2002Based in Tokyo, JP· patent location history
1989–2002Patents assigned to NIKON CORP (11)· patent assignee history
1994Patents assigned to JEOL LTD (1)· patent assignee history
2011Patents assigned to ADVANTEST CORP (1)· patent assignee history
2011Based in Saitama, JP· patent location history
2015Patents assigned to KATO MASAHIRO (1)· patent assignee history
2015Based in Himeji, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 11 | 1989–2002 |
| NIPPON KOGAKU KK | 8 | 1984–1988 |
| ADVANTEST CORP | 1 | 2011 |
| JEOL LTD | 1 | 1994 |
| KATO MASAHIRO | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 14 | 1988–2002 |
| Koshigaya, JP | 8 | 1984–1988 |
| Himeji, JP | 1 | 2015 |
| Saitama, JP | 1 | 2011 |