Inventor
Hiroyuki Inomata
Inventor
Osaka, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
C03CChemical composition of glasses, glazes or vitreous enamels16%
Y10TTechnical subjects covered by former us classification16%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry10%
B24BMachines, devices, or processes for grinding or polishing6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers3%
C08JWorking-up3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
PatentTitleYear
7,727,407'Amorphous material processing method'20107,289,173'Polarizing device, and method for manufacturing the same'20077,289,657'Method of inspecting photo-mask'20077,045,259'Post exposure modification of critical dimensions in mask fabrication'20067,045,260'Post exposure modification of critical dimensions in mask fabrication'20066,913,702'Amorphous material processing method and glass substrate'20056,833,089'Article having photocatalytic activity'20046,801,295'Post exposure modification of critical dimensions in mask fabrication'20046,576,344'Photocatalyst article, anti-fogging, anti-soiling articles, and production method of anti-fogging, anti-soiling articles'20036,436,542'Multilayer structure and process for producing the same'20026,399,212'Silicon dioxide-coated polyolefin resin and process for its production'20025,556,724'Phase shift photomask and method of producing same'19965,397,665'Photomask with pellicle and method of treating and storing the same'19955,330,053'Case for photomask'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2007Patents assigned to DAINIPPON PRINTING CO LTD (4)· patent assignee history
1994–2007Based in Tokyo, JP· patent location history
2002–2010Patents assigned to NIPPON SHEET GLASS CO LTD (7)· patent assignee history
2002–2007Based in Osaka, JP· patent location history
2004–2006Patents assigned to INTEL CORP (3)· patent assignee history
2004Based in Asaki, JP· patent location history
2005–2010Based in Takarazuka, JP· patent location history
2006Based in Asaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIPPON SHEET GLASS CO LTD | 7 | 2002–2010 |
| DAINIPPON PRINTING CO LTD | 4 | 1994–2007 |
| INTEL CORP | 3 | 2004–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Osaka, JP | 5 | 2002–2007 |
| Tokyo, JP | 4 | 1994–2007 |
| Takarazuka, JP | 2 | 2005–2010 |
| Asaka, JP | 2 | 2006 |
| Asaki, JP | 1 | 2004 |