Inventor
W. Thomas Novak
Inventor
San Jose, CA, US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B01DSeparation3%
F16CShafts3%
F21VFunctional features or details of lighting devices or systems thereof3%
F21YIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to the form or the kind of the light sources or of the colour of the light emitted3%
G05BControl or regulating systems in general3%
PatentTitleYear
10,185,222Liquid jet and recovery system for immersion lithography20199,910,370'Environmental system including a transport region for an immersion lithography apparatus'20189,785,057'Liquid jet and recovery system for immersion lithography'20179,632,427'Environmental system including a transport region for an immersion lithography apparatus'20179,304,409'Liquid jet and recovery system for immersion lithography'20169,244,363'Environmental system including a transport region for an immersion lithography apparatus'20169,086,636'Optical arrangement of autofocus elements for use with immersion lithography'20156,318,087'Degassing system for power plants'20016,140,734'Armature with regular windings and having a high conductor density'20005,760,564'Dual guide beam stage mechanism with yaw control'19984,723,086'Coarse and fine motion positioning mechanism'19884,704,033'Multiple wavelength linear zone plate alignment apparatus and method'19874,648,106'Gas control for X-ray lithographic system'19874,549,843'Mask loading apparatus, method and cassette'19854,516,253'Lithography system'19854,514,858'Lithography system'19854,376,580'Projection aligner with bending mirror'19834,244,012'Lamp holder for projection aligner'19813,955,163'Method of positioning a semiconductor wafer for contact printing'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1983Patents assigned to COMPUTERVISION CORP (3)· patent assignee history
1976–1988Based in San Jose, CA, US· patent location history
1985Patents assigned to MICRONIX PARTNERS (3)· patent assignee history
1987–1988Patents assigned to MICRONIX CORP (3)· patent assignee history
1998–2000Based in Hillsborough, CA, US· patent location history
2001Patents assigned to ALSTOM (1)· patent assignee history
2001Based in Lengnau, CH· patent location history
2015–2019Patents assigned to NIKON CORP (7)· patent assignee history
2015–2019Based in Redwood City, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 7 | 2015–2019 |
| COMPUTERVISION CORP | 3 | 1976–1983 |
| MICRONIX CORP | 3 | 1987–1988 |
| MICRONIX PARTNERS | 3 | 1985 |
| ALSTOM | 1 | 2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 9 | 1976–1988 |
| Redwood City, California, US | 7 | 2015–2019 |
| Hillsborough, California, US | 2 | 1998–2000 |
| Lengnau, CH | 1 | 2001 |