Inventor

Chih-Han Lin

Inventor

Hsinchu, TW

Overview

2011–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 237 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary

H01LSemiconductor devices32%

H10DInorganic electric semiconductor devices31%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1016%

H10BElectronic memory devices2%

F03GSpring, weight, inertia or like motors0%

H01JElectric discharge tubes or discharge lamps0%

G01NInvestigating or analysing materials by determining their chemical or physical properties0%

PatentTitleYear

10,879,364Semiconductor structure and manufacturing method thereof2020 10,872,965Method of forming semiconductor structure2020 10,872,890Semiconductor device2020 10,872,968Semiconductor device2020 10,868,002Semiconductor structure and manufacturing method thereof2020 10,868,012Semiconductor device and manufacturing method thereof2020 10,867,865Method and structure for FinFET isolation2020 10,868,179Fin-type field effect transistor structure and manufacturing method thereof2020 10,868,139Controlling profiles of replacement gates2020 10,868,189Semiconductor device and manufacturing method thereof2020 10,868,138Metal gate formation through etch back process2020 10,868,188Semiconductor device and method2020 10,861,977FinFET isolation structure2020 10,854,507Method of forming trenches2020 10,854,742Metal gate electrode of a semiconductor device2020 10,854,504Semiconductor structure and manufacturing method thereof2020 10,854,542Via structure and methods thereof2020 10,840,144Structure and formation method of semiconductor device structure2020 10,840,153Notched gate structure fabrication2020 10,840,242Fin structure and method of forming same through two-step etching processes2020 10,840,379Semiconductor device2020 10,811,536FinFET device and method of forming and monitoring quality of the same2020 10,811,538Semiconductor device with gate stack2020 10,811,412Method of fabricating semiconductor device2020 10,811,506Self-aligned metal gate etch back process and device2020 10,797,140Semiconductor device and method2020 10,796,955Fin field effect transistor (FinFET) device structure with interconnect structure2020 10,777,419Semiconductor device with fin isolation and method of forming the same2020 10,763,362Fin field effect transistor (FinFET) device structure with stop layer and method for forming the same2020 10,763,258Integrated circuit and manufacturing method thereof2020 10,748,912Method for semiconductor device fabrication with improved source drain proximity2020 10,749,014Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features2020 10,727,178Via structure and methods thereof2020 10,727,132Fin field effect transistor, semiconductor device and method for fabricating the same2020 10,727,227Fin-type field effect transistor structure and manufacturing method thereof2020 10,714,581Semiconductor device and manufacturing method thereof2020 10,714,588Metal gate process for FinFET device improvement2020 10,700,208Semiconductor device and methods of manufacture2020 10,700,180Semiconductor structure and manufacturing method thereof2020 10,692,723Gate isolation plugs structure and method2020 10,692,701Dry etching apparatus2020 10,679,989Enlarging spacer thickness by forming a dielectric layer over a recessed interlayer dielectric2020 10,672,796Mechanisms for forming FINFET device2020 10,672,908Fin field effect transistor2020 10,658,491Controlling profiles of replacement gates2020 10,658,485Semiconductor device and manufacturing method thereof2020 10,643,947Semiconductor structure and manufacturing method thereof2020 10,636,787Semiconductor structure and manufacturing method thereof2020 10,629,491Semiconductor manufacturing method2020 10,622,353Semiconductor device2020 10,553,706Method for manufacturing semiconductor fin structure with extending gate structure2020 10,546,754Semiconductor structure and manufacturing method thereof2020 10,541,204Interconnection structure and method of forming the same2020 10,535,603Method of forming interconnection structure2020 10,535,758Gate structure of field effect transistor with footing2020 10,535,558Method of forming trenches2020 10,522,414Method and structure for FinFET isolation2019 10,522,536Structure and formation method of semiconductor device with gate stacks2019 10,522,635Semiconductor device and method2019 10,515,955Methods of manufacturing transistor gate structures by local thinning of dummy gate stacks using an etch barrier2019 10,516,052Semiconductor device and method2019 10,515,793FinFET device2019 10,515,959Source/drain regions in fin field effect transistors (finFETs) and methods of forming same2019 10,515,960Semiconductor device and method2019 10,510,897Semiconductor device and manufacturing method thereof2019 10,510,850Semiconductor device and method2019 10,510,752Semiconductor device and manufacturing method thereof2019 10,510,755Semiconductor device and manufacture method thereof2019 10,510,893Method for fabricating FinFET isolation structure2019 10,510,890Fin-type field effect transistor structure and manufacturing method thereof2019 10,510,866Semiconductor structure and fabrication method thereof2019 10,510,539Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same2019 10,510,896Method for manufacturing semiconductor device2019 10,504,895FinFET isolation structure and method for fabricating the same2019 10,505,003Semiconductor structure and manufacturing method thereof2019 10,497,793Method for manufacturing semiconductor structure2019 10,483,364Semiconductor structure and manufacturing method thereof2019 10,483,398Semiconductor device with gate stack2019 10,468,308FinFET structures and methods of forming the same2019 10,468,348Method for manufacturing interconnection2019 10,460,942Method of manufacturing semiconductor structure2019 10,431,687Structure and formation method of semiconductor device structure2019 10,396,184Integrated circuit device fins2019 10,395,983Method of forming trenches2019 10,367,079Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features2019 10,366,926Structure and formation method of semiconductor device structure2019 10,366,915FinFET devices with embedded air gaps and the fabrication thereof2019 10,366,990Fin field effect transistor and semiconductor device2019 10,355,110FinFET and method of forming same2019 10,332,790Fin field effect transistor (FinFET) device structure with interconnect structure2019 10,332,879Fin-type field effect transistor structure and manufacturing method thereof2019 10,332,991Metal gate electrode of a semiconductor device2019 10,312,352Gate structure of field effect transistor with footing2019 10,283,641Contact structures, FinFET devices and methods of forming the same2019 10,283,605Self-aligned metal gate etch back process and device2019 10,276,662Method of forming contact trench2019 10,269,793Source/drain regions in fin field effect transistors (FinFETs) and methods of forming same2019 10,269,650Structure and formation method of semiconductor device structure2019 10,269,802Semiconductor device and manufacturing method thereof2019 10,269,908FinFET and method of forming same2019 10,269,795Semiconductor structure and manufacturing method thereof2019 10,263,113Semiconductor device and method2019 10,263,090Semiconductor device and manufacturing method thereof2019 10,217,741Fin structure and method of forming same through two-step etching processes2019 10,205,004FinFET isolation structure and method for fabricating the same2019 10,192,987Fin-type field effect transistor structure and manufacturing method thereof2019 10,186,511Metal gate isolation structure and method forming same2019 10,177,005Critical dimension control for double patterning process2019 10,170,427Semiconductor device and method2019 10,164,113Semiconductor device and manufacturing method thereof2018 10,163,722Method and structure for FinFet isolation2018 10,163,649Semiconductor structure and manufacturing method thereof2018 10,163,912Method for semiconductor device fabrication with improved source drain proximity2018 10,164,029Semiconductor structure and manufacturing method thereof2018 10,164,111Semiconductor device and methods of manufacture2018 10,164,046Method for manufacturing semiconductor structure2018 10,163,640Gate isolation plugs structure and method2018 10,157,918Semiconductor device and method2018 10,157,795Semiconductor device2018 10,157,783Semiconductor devices, FinFET devices and methods of forming the same2018 10,153,374Semiconductor device and manufacturing method thereof2018 10,153,370Fin-type field effect transistor structure and manufacturing method thereof2018 10,147,821Fin field effect transistor2018 10,134,669Method for forming fin field effect transistor (FinFET) device structure with interconnect structure2018 10,121,787Methods for fabricating Fin field effect transistors2018 10,109,627Enlarging spacer thickness by forming a dielectric layer over a recessed interlayer dielectric2018 10,096,712FinFET device and method of forming and monitoring quality of the same2018 10,096,598Methods for fabricating fin field effect transistors2018 10,090,249Semiconductor structure and manufacturing method thereof2018 10,084,085Fin field effect transistor (FinFET) device structure with stop layer and method for forming the same2018 10,079,205Interconnection structure and method of forming the same2018 10,049,922Method of forming trenches2018 10,050,128Gate structure of field effect transistor with footing2018 10,043,886Metal gate formation through etch back process2018 10,037,917Structure and formation method of semiconductor device structure2018 10,037,993Method of making a FinFET device2018 10,032,914Semiconductor device and manufacturing method thereof2018 10,032,877FinFET and method of forming same2018 10,032,913Contact structures, FinFET devices and methods of forming the same2018 10,032,774Semiconductor device and manufacture method thereof2018 10,032,916Formation method of semiconductor device structure with gate stack2018 10,020,304Fin field effect transistor, semiconductor device and fabricating method thereof2018 9,997,632Fin-type field effect transistor device and manufacturing method thereof2018 9,991,256Semiconductor structure and manufacturing method thereof2018 9,991,205Semiconductor device and method2018 9,991,375Metal gate electrode of a semiconductor device2018 9,991,285Mechanisms for forming FinFET device2018 9,985,031Integrated circuit and manufacturing method thereof2018 9,954,081Fin field effect transistor, semiconductor device and fabricating method thereof2018 9,953,874FinFETs and methods of forming FinFETs2018 9,941,407Method of forming FinFET2018 9,934,985Critical dimension control for double patterning process2018 9,935,103Semiconductor device and manufacturing method thereof2018 9,929,242'Semiconductor device and manufacturing method thereof'2018 9,929,271'Semiconductor device and method'2018 9,923,070'Semiconductor structure and manufacturing method thereof'2018 9,922,816'Source and drain process for FinFET'2018 9,917,085'Metal gate isolation structure and method forming same'2018 9,917,176'Method for fabricating FinFET isolation structure'2018 9,911,645'Method for forming fin field effect transistor (FinFET) device structure with interconnect structure'2018 9,899,266'FinFET structures and methods of forming the same'2018 9,899,320'Interconnection and manufacturing method thereof'2018 9,893,184'Fin-type field effect transistor device and method of fabricating the same'2018 9,893,060'Semiconductor device and manufacturing method thereof'2018 9,887,136'Semiconductor devices, FinFET devices, and methods of forming the same'2018 9,876,115FinFET isolation structure and method for fabricating the same2018 9,859,156'Interconnection structure with sidewall dielectric protection layer'2018 9,847,330Fin field effect transistor and method for fabricating the same2017 9,837,505Metal gate process for FinFET device improvement2017 9,837,536Semiconductor device including fin structures and manufacturing method therof2017 9,837,510Method for manufacturing semiconductor fin structure with extending gate structure2017 9,818,649'Method and structure for FinFET isolation'2017 9,812,549'Formation method of semiconductor device structure'2017 9,799,651'Semiconductor structure and manufacturing method thereof'2017 9,799,649'Semiconductor device and manufacturing method thereof'2017 9,793,407'Fin field effect transistor'2017 9,793,406'Semiconductor device and manufacturing method thereof'2017 9,786,505'FinFET device using dummy fins for smooth profiling'2017 9,786,564'Semiconductor device and manufacturing method thereof'2017 9,780,026'Interconnection structure and method of forming the same'2017 9,780,092'Semiconductor device having a filling conductor comprising a plug portion and a cap portion and manufacturing method thereof'2017 9,773,871'Fin field effect transistor and method for fabricating the same'2017 9,773,912'Semiconductor device and manufacturing method thereof'2017 9,773,696'Semiconductor structure and manufacturing method thereof'2017 9,768,170'Fin field effect transistor and method for fabricating the same'2017 9,768,168'Fin-type field effect transistor structure and manufacturing method thereof'2017 9,761,483'Semiconductor devices, FinFET devices and methods of forming the same'2017 9,748,394'FinFET having a multi-portioned gate stack'2017 9,735,256'Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features'2017 9,728,501'Method of forming trenches'2017 9,722,079'Fin-type field effect transistor structure and manufacturing method thereof'2017 9,716,093'Semiconductor device'2017 9,716,154'Semiconductor structure having a gas-filled gap'2017 9,704,752'Fin field effect transistor and method for fabricating the same'2017 9,704,751'Semiconductor device and method for fabricating the same'2017 9,704,969'Fin semiconductor device having multiple gate width structures'2017 9,685,554'Fin field effect transistor and semiconductor device'2017 9,673,331'Structure and formation method of semiconductor device structure'2017 9,659,813'Interconnection and manufacturing method thereof'2017 9,653,364'FinFET device and method of forming the same'2017 9,627,375'Indented gate end of non-planar transistor'2017 9,627,316'Field effect transistor devices having interconnect structures and manufacturing method thereof'2017 9,627,537'FinFET device and method of forming the same'2017 9,627,379'FinFET devices and methods of forming the same'2017 9,620,417'Apparatus and method of manufacturing fin-FET devices'2017 9,620,621'Gate structure of field effect transistor with footing'2017 9,614,089'Structure and formation method of semiconductor device structure'2017 9,590,032'Fin-FET device and manufacturing method thereof'2017 9,577,036'FinFET isolation structure and method for fabricating the same'2017 9,570,567'Source and drain process for FinFET'2017 9,559,100'Semiconductor device and manufacturing method thereof'2017 9,543,381'Semiconductor structure and manufacturing method of the same'2017 9,536,826'Fin field effect transistor (finFET) device structure with interconnect structure'2017 9,530,887'Fin-type field effect transistor device and manufacturing method thereof'2016 9,508,830'Method of forming FinFET'2016 9,508,719'Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same'2016 9,502,567'Semiconductor fin structure with extending gate structure'2016 9,496,363'FinFET isolation structure and method for fabricating the same'2016 9,496,372'Method of making a FinFET device'2016 9,490,176'Method and structure for FinFET isolation'2016 9,461,044'Fin field effect transistor, semiconductor device and fabricating method thereof'2016 9,460,968'Fin shape for fin field-effect transistors and method of forming'2016 9,461,043'Semiconductor device and manufacturing method thereof'2016 9,450,099'Structure and formation method of semiconductor device structure'2016 9,406,680'Semiconductor device including fin structures and manufacturing method thereof'2016 9,401,415'Fin field effect transistor (FinFET) device and method for forming the same'2016 9,391,205'Gate last semiconductor structure and method for forming the same'2016 9,384,988'Gate protection caps and method of forming the same'2016 9,331,074'Semiconductor device and manufacturing method thereof'2016 9,306,037'Dummy gate electrode of semiconductor device'2016 9,245,883'Method of making a FinFET device'2016 9,153,440'Method of forming a semiconductor device'2015 9,041,125'Fin shape for fin field-effect transistors and method of forming'2015 8,803,241'Dummy gate electrode of semiconductor device'2014 8,722,541'Double patterning method for semiconductor devices'2014 8,163,625'Method for fabricating an isolation structure'2012 8,034,722'Method of forming dual damascene semiconductor device'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (9)· patent assignee history

2011–2012Based in Tainan, TW· patent location history

2012–2015Patents assigned to LIN CHIH-HAN (4)· patent assignee history

2012–2015Patents assigned to CHEN RYAN CHIA-JEN (2)· patent assignee history

2014–2015Patents assigned to CHANG MING-CHING (2)· patent assignee history

2014–2018Based in Zhubei City, TW· patent location history

2015–2020Based in Hsinchu, TW· patent location history

2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (227)· patent assignee history

2017Based in New Taipei, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	227	2016–2020
TAIWAN SEMICONDUCTOR MFG	9	2011–2016
LIN CHIH-HANself	4	2012–2015
CHANG MING-CHING	2	2014–2015
CHEN RYAN CHIA-JEN	2	2012–2015

Locations

Location	Patents	Span
Hsinchu, TW	230	2015–2020
Zhubei City, TW	4	2014–2018
Tainan, TW	2	2011–2012
New Taipei, TW	1	2017