Inventor

Hisayoshi Watanabe

Inventor

Tokyo, JP

Overview

1995–2021

Patent span

Physics

Primary field (CPC G)

Patents· 47 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Bprimary

G11BInformation storage based on relative movement between record carrier and transducer20%

G11CStatic stores11%

Y10TTechnical subjects covered by former us classification7%

H10BElectronic memory devices6%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%

C08LCompositions of macromolecular compounds2%

F01DNon-positive displacement machines or engines, e.g. steam turbines2%

PatentTitleYear

11,003,404Information processing apparatus, information processing method and non-transitory recording medium2021 10,985,949Transmission control device, reception control device, and transmission/reception control system2021 10,982,566Turbine and gas turbine2021 10,982,544Turbine and gas turbine2021 10,967,789Safe driving assistance device2021 10,931,072Transmitting device, reception device, and optical-electrical composite cable2021 10,919,094Cutting device and cutting method2021 10,908,120Semiconductor biosensor and control method thereof2021 10,900,536Damper2021 10,895,733Microscope system2021 10,882,962SRT material, composite and method for producing the same2021 9,792,934'Multi reader head having a varying gap layer laminated between readers'2017 9,767,834'Magnetic head comprising magneto-resistance effect element and side shields'2017 9,747,933'Magneto-resistive effect element having side shield integrated with upper shield'2017 9,087,982'Manufacturing method for pattern multilayer body and mask set'2015 8,790,523'Method for manufacturing magnetic head'2014 8,760,805'Thin film magnetic head, thin film magnetic head device, and magnetic recording/reproducing apparatus'2014 8,654,479'Thin-film magnetic recording head with thin film which constructs sensor or heater beneath main magnetic pole'2014 8,559,133'Perpendicular magnetic write head and magnetic write device'2013 8,529,777'Method of making a mask, method of patterning by using this mask and method of manufacturing a micro-device'2013 8,472,137'Magnetic head and method of manufacture thereof wherein the head includes a pole layer and non-magnetic layer having a continuous tapered face opposed to a trailing shield'2013 8,420,299'Forming method of resist pattern and manufacturing method of thin-film magnetic head'2013 8,404,431'Method for manufacturing thin-film magnetic head'2013 8,379,346'Method of forming metal to a concave portion of a substrate, method of manufacturing a magnetic head and a magnetic head'2013 8,323,517'Method of forming magnetic pole section of perpendicular magnetic recording type thin-film magnetic head and manufacturing method of perpendicular magnetic recording type thin-film magnetic head'2012 8,282,843'Method for manufacturing perpendicular magnetic head including a main pole surrounded by shield layers'2012 8,117,737'Method of manufacturing magnetic head for perpendicular magnetic recording with shield around main magnetic pole'2012 8,080,167'Shaping method of thin film and manufacturing method of perpendicular recording magnetic head using the same'2011 8,072,706'Magnetic head for perpendicular magnetic recording and method of manufacturing same'2011 7,808,742'Thin-film magnetic head comprising shield/magnetic-pole layer having surface without right nor sharp angle'2010 6,916,597'Method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device'2005 6,897,268'Fluidized bed polymerization apparatus and an olefin polymerization process'2005 6,893,802'Method of forming patterned thin film and method of fabricating micro device'2005 6,762,107'Capacitor and manufacturing method thereof'2004 6,461,573'Fluidized bed polymerization apparatus having temperature distribution monitoring'2002 6,014,329'Flash-erasable semiconductor memory device having an improved reliability'2000 5,910,916'Flash-erasable semiconductor memory device having improved reliability'1999 5,870,337'Flash-erasable semiconductor memory device having an improved reliability'1999 5,835,416'Flash-erasable semiconductor memory device having an improved reliability'1998 5,835,408'Flash-erasable semiconductor memory device having an improved reliability'1998 5,761,127'Flash-erasable semiconductor memory device having an improved reliability'1998 5,724,289'Nonvolatile semiconductor memory capable of selectively performing a pre-conditioning of threshold voltage before an erase self-test of memory cells and a method related therewith'1998 5,612,115'Metal-deposited polyester film capacitor'1997 5,592,427'Semiconductor memory having a sense amplifier with load transistors having different load characteristics'1997 5,566,386'Nonvolatile semiconductor memory device having a status register and test method for the same'1996 5,469,394'Nonvolatile semiconductor memory device having a status register and test method for the same'1995 5,402,380'Nonvolatile semiconductor memory device having a status register and test method for the same'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2000Patents assigned to FUJITSU LTD (11)· patent assignee history

1995–2000Based in Kawasaki, JP· patent location history

1998–2000Patents assigned to FUJITSU VLSI LTD (6)· patent assignee history

2002–2005Based in Sodegaura, JP· patent location history

2005–2017Patents assigned to TDK CORP (21)· patent assignee history

2005–2021Based in Tokyo, JP· patent location history

2011–2014Patents assigned to WATANABE HISAYOSHI (14)· patent assignee history

2012–2014Patents assigned to NOJIMA TATSUHIRO (5)· patent assignee history

2021Based in Kanagawa, JP· patent location history

2021Based in Yokohama-shi, Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TDK CORP	21	2005–2017
WATANABE HISAYOSHIself	14	2011–2014
FUJITSU LTD	11	1995–2000
FUJITSU VLSI LTD	6	1998–2000
NOJIMA TATSUHIRO	5	2012–2014

Locations

Location	Patents	Span
Tokyo, JP	23	2005–2021
Kawasaki, JP	11	1995–2000
Kanagawa, JP	3	2021
Sodegaura, JP	2	2002–2005
Yokohama-shi, Kanagawa, JP	1	2021