Inventor
Laura Dinu-Gürtler
Inventor
Delft, NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
B82YSpecific uses or applications of nanostructures20%
PatentTitleYear
10,622,188Focusing electrode for cathode arrangement, electron gun, and lithography system comprising such electron gun20209,466,453'Cathode arrangement, electron gun, and lithography system comprising such electron gun'20169,455,112'Cathode arrangement, electron gun, and lithography system comprising such electron gun'20168,916,837'Charged particle lithography system with intermediate chamber'20148,586,949'Charged particle lithography system with intermediate chamber'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2016Patents assigned to MAPPER LITHOGRAPHY IP BV (4)· patent assignee history
2013Patents assigned to DINU-GUERTLER LAURA (1)· patent assignee history
2013Patents assigned to STEENBRINK STIJN WILLEM HERMAN KAREL (1)· patent assignee history
2013Patents assigned to URBANUS WILLEM HENK (1)· patent assignee history
2013–2020Based in Delft, NL· patent location history
2020Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MAPPER LITHOGRAPHY IP BV | 4 | 2013–2016 |
| ASML NETHERLANDS BV | 1 | 2020 |
| DINU-GUERTLER LAURA | 1 | 2013 |
| STEENBRINK STIJN WILLEM HERMAN KAREL | 1 | 2013 |
| URBANUS WILLEM HENK | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Delft, NL | 5 | 2013–2020 |