Inventor

Hiroyuki Hoshina

Inventor

Funabashi, JP

Overview

2011–2014

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C25Dprimary

C25DProcesses for the electrolytic or electrophoretic production of coatings36%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry9%

C02FTreatment of water, waste water, sewage, or sludge9%

D06MTreatment, not provided for elsewhere in class d06, of fibres, threads, yarns, fabrics, feathers or fibrous goods made from such materials9%

G21FProtection against x-radiation, gamma radiation, corpuscular radiation or particle bombardment9%

Y10TTechnical subjects covered by former us classification9%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2011–2014Patents assigned to SEIKO INSTR INC (4)· patent assignee history

2011Based in Chiba, JP· patent location history

2013Patents assigned to HOSHINA HIROYUKI (2)· patent assignee history

2013Patents assigned to IWANADE AKIO (1)· patent assignee history

2013Patents assigned to JAPAN ATOMIC ENERGY AGENCY (1)· patent assignee history

2013Patents assigned to JUJO KOICHIRO (1)· patent assignee history

2013–2014Based in Funabashi, JP· patent location history

2013Based in Takasaki, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations