Inventor
Yoko Hirohara
Inventor
Tokyo, JP
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
A61Bprimary
A61BDiagnosis91%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G06TImage data processing or generation, in general3%
G09BEducational or demonstration appliances3%
PatentTitleYear
7,850,305'Apparatus and method for measuring spectrum image data of eyeground'20107,806,529'Device and method for optometry'20107,677,728'Ophthalmologic measuring apparatus'20107,677,731'Eye optical characteristic measuring apparatus'20107,568,800'Apparatus and method for spectrally measuring fundus'20097,490,939'Eye characteristics measuring system'20097,465,049'Portable ophthalmic apparatus and ophthalmic system'20087,441,900'Contrast chart device, contrast sensitivity measuring device and contrast sensitivity measuring method'20087,360,894'Opthalmological apparatus'20087,311,402'Eye optical characteristic measuring instrument'20077,309,127'Ophthalmic measuring apparatus'20077,309,126'Eye characteristics measuring device'20077,270,413'Ophthalmic data measuring apparatus, ophthalmic data measurement program and eye characteristic measuring apparatus'20077,249,852'Eye characteristic measuring apparatus'20077,249,851'Eye characteristic measuring apparatus'20077,246,906'Correction-factor determination apparatus and method'20077,241,012'Ophthalmologic apparatus'20077,222,962'Opthalmic measuring apparatus'20077,219,999'Device for measuring optical characteristic of eye'20077,216,980'Eye characteristic measuring apparatus'20077,036,933'Model eye for eye characteristic measuring device and calibration method for the same'20066,905,209'Optical characteristics measuring device'20056,860,603'BEST CORRECTED VISUAL ACUITY CHARACTERISTICS MEASURING DEVICE, BEST CORRECTED VISUAL ACUITY CHARACTERISTICS MEASURING METHOD, CONTRAST SENSITIVITY MEASURING DEVICE, CONTRAST SENSITIVITY MEASURING METHOD, AND CONTRAST SENSITIVITY TARGET DISPLAYING DEVICE'20056,802,609'Eye characteristic measuring apparatus'20046,695,450'Ophthalmic characteristics measuring apparatus'20046,685,320'Opthalmic characteristic measuring apparatus'20046,629,761'Eye characteristic measuring apparatus'20036,536,900'Eye characteristic measuring apparatus'20036,525,883'Optical characteristic measuring instrument'20036,354,705'Anterior segment photographing apparatus for producing images of a section of the anterior segment of the eye to be examined by using slit light beam'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2010Patents assigned to TOPCON CORP (29)· patent assignee history
2002–2010Based in Tokyo, JP· patent location history
2010Patents assigned to Kabuhsiki Kaisha Topcon (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOPCON CORP | 29 | 2002–2010 |
| Kabuhsiki Kaisha Topcon | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 30 | 2002–2010 |