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Inventor

Christianus W. J. Berendsen

Inventor
Veldhoven, NL

Overview

3→
Patents
2015–2019
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G21KHandling of particles or ionising radiation not otherwise provided for25%
H05GX-ray technique25%
B01LChemical or physical laboratory apparatus for general use13%
G01NInvestigating or analysing materials by determining their chemical or physical properties13%
PatentTitleYear
10,490,313Method of controlling debris in an EUV light source201910,128,017Apparatus for and method of controlling debris in an EUV light source20189,201,059'Microfluidic system and a method of performing a test'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015Patents assigned to BAU-MADSEN NIELS KRISTIAN (1)· patent assignee history
2015Patents assigned to BERENDSEN CHRISTIANUS (1)· patent assignee history
2015Patents assigned to JONSMANN JACQUES (1)· patent assignee history
2015Patents assigned to OVERBY BENT (1)· patent assignee history
2015Based in Soborg, DK· patent location history
2018–2019Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2018–2019Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22018–2019
BAU-MADSEN NIELS KRISTIAN12015
BERENDSEN CHRISTIANUSself12015
JONSMANN JACQUES12015
OVERBY BENT12015
Locations
LocationPatentsSpan
Veldhoven, NL22018–2019
Soborg, DK12015