Inventor
YOUNG-HOO KIM
Inventor
KR
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
B08BCleaning in general13%
B23KSoldering or unsoldering7%
F26BDrying solid materials or objects by removing liquid therefrom7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
C11DDetergent compositions3%
G02BOptical elements, systems or apparatus1%
H01JElectric discharge tubes or discharge lamps1%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy1%
PatentTitleYear
12,578,647Substrate rotating apparatus, substrate processing system including the same, and substrate processing method using the same202612,468,227Apparatus and method for processing substrate202512,463,061Wafer drying apparatus, wafer processing system including the same, and wafer processing method using the same202512,322,587Substrate drying apparatus and semiconductor device manufacturing method using same202512,211,716Substrate processing apparatus and substrate processing method202512,198,923Substrate processing method and substrate processing system202512,165,866Wafer cleaning apparatus and wafer cleaning method using the same202412,042,828Wafer cleaning apparatus and wafer cleaning method using the same202411,887,868Substrate processing apparatus and apparatus for manufacturing integrated circuit device202411,862,457Wafer cleaning apparatus, method for cleaning wafer and method for fabricating semiconductor device202411,742,221Dry cleaning apparatus and dry cleaning method202311,721,565Multi-chamber apparatus202311,648,594Wafer cleaning apparatus and wafer cleaning method using the same202311,610,788Process chamber and substrate processing apparatus including the same202311,581,182Wafer cleaning apparatus, method for cleaning wafer and method for fabricating semiconductor device202311,189,503Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying system202111,149,234Cleaning composition, cleaning apparatus, and method of fabricating semiconductor device using the same2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (17)· patent assignee history
2021–2025Patents assigned to SEMES CO LTD (3)· patent assignee history
2021–2026Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 17 | 2021–2026 |
| SEMES CO LTD | 3 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 17 | 2021–2026 |