Inventor
Kiyoshi Nashimoto
Inventor
Fuchu, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
Y10TTechnical subjects covered by former us classification20%
G01KMeasuring temperature13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
PatentTitleYear
6,785,115'Electrostatic chuck and substrate processing apparatus'20045,956,616'Method of depositing thin films by plasma-enhanced chemical vapor deposition'19995,334,251'Method of and apparatus for controlling temperature in the processing of a substrate'19945,147,498'Apparatus for controlling temperature in the processing of a substrate'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2004Patents assigned to ANELVA CORP (4)· patent assignee history
1992–1994Based in Fuchu, JP· patent location history
1999Based in Hachiouji, JP· patent location history
2004Patents assigned to NGK INSULATORS LTD (1)· patent assignee history
2004Based in Hachiouzi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ANELVA CORP | 4 | 1992–2004 |
| NGK INSULATORS LTD | 1 | 2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fuchu, JP | 2 | 1992–1994 |
| Hachiouzi, JP | 1 | 2004 |
| Hachiouji, JP | 1 | 1999 |