Inventor
Isao Gunji
Inventor
Nirasaki, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material46%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
C23FNon-mechanical removal of metallic material from surface8%
H01JElectric discharge tubes or discharge lamps8%
PatentTitleYear
8,562,751'Dry cleaning method of substrate processing apparatus'20138,551,565'Film forming method and film forming apparatus'20138,419,856'Substrate processing apparatus'20138,124,168'Substrate processing method and substrate processing apparatus'20128,029,856'Film formation method and apparatus'20117,582,544'ALD film forming method'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2013Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2009–2013Based in Nirasaki, JP· patent location history
2012–2013Patents assigned to GUNJI ISAO (4)· patent assignee history
2013Patents assigned to ITOH HITOSHI (2)· patent assignee history
2013Patents assigned to CENTRAL GLASS CO LTD (1)· patent assignee history
2013Patents assigned to IZAWA YUSAKU (1)· patent assignee history
2013Based in Yamanashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 6 | 2009–2013 |
| GUNJI ISAOself | 4 | 2012–2013 |
| ITOH HITOSHI | 2 | 2013 |
| CENTRAL GLASS CO LTD | 1 | 2013 |
| IZAWA YUSAKU | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 5 | 2009–2013 |
| Yamanashi, JP | 1 | 2013 |