Inventor
Christoph Nölscher
Inventor
Nürnberg, DE
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy17%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
H10BElectronic memory devices3%
H10DInorganic electric semiconductor devices3%
Y02PClimate change mitigation technologies in the production or processing of goods3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
8,003,538'Method for producing a structure on the surface of a substrate'20117,867,912'Methods of manufacturing semiconductor structures'20117,491,474'Masks for lithographic imagings and methods for fabricating the same'20097,443,484'Method for exposing a semiconductor wafer by applying periodic movement to a component'20087,368,385'Method for producing a structure on the surface of a substrate'20087,361,434'Phase shift mask'20087,297,468'Method for forming a structure element on a wafer by means of a mask and a trimming mask assigned hereto'20077,286,207'Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration'20077,207,030'Method for improving a simulation model of photolithographic projection'20077,070,887'Photolithographic mask'20067,011,936'Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools'20066,730,463'Method for determining and removing phase conflicts on alternating phase masks'20046,680,151'Alternating phase mask'20046,569,772'Method for producing an alternating phase mask'20036,162,556'Method for operating a high-temperature fuel cell installation, and a high-temperature fuel cell installation'20006,162,554'Method and system for utilizing enthalpy contained in exhaust gases of low-temperature fuel cells'20006,080,502'Fluid-cooled fuel cell with distribution ducts'20006,010,798'PEM fuel cell'20005,976,722'Process for operating a fuel cell installation and fuel cell installation for carrying out the process'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999Patents assigned to SIEMENS AKTIENGESELLSCHATF (1)· patent assignee history
1999–2000Based in Nurnberg, DE· patent location history
2000Patents assigned to SIEMENS AG (3)· patent assignee history
2000Patents assigned to SIEMENS AKTENGESELLSCHAFT (1)· patent assignee history
2003–2009Patents assigned to INFINEON TECHNOLOGIES AG (12)· patent assignee history
2003–2004Based in Nrnberg, DE· patent location history
2006–2011Based in Nürnberg, DE· patent location history
2006Based in München, DE· patent location history
2007–2008Based in Dresden, DE· patent location history
2011Patents assigned to QIMONDA AG (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INFINEON TECHNOLOGIES AG | 12 | 2003–2009 |
| SIEMENS AG | 3 | 2000 |
| QIMONDA AG | 2 | 2011 |
| SIEMENS AKTENGESELLSCHAFT | 1 | 2000 |
| SIEMENS AKTIENGESELLSCHATF | 1 | 1999 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nürnberg, DE | 7 | 2006–2011 |
| Nurnberg, DE | 5 | 1999–2000 |
| Dresden, DE | 3 | 2007–2008 |
| Nrnberg, DE | 3 | 2003–2004 |
| München, DE | 1 | 2006 |