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Inventor

Ryosuke Taniguchi

Inventor
Joetsu-shi, JP

Overview

25→
Patents
1997–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
C07CAcyclic or carbocyclic compounds11%
C07DHeterocyclic compounds9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
H01LSemiconductor devices5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
B06BMethods or apparatus for generating or transmitting mechanical vibrations of infrasonic, sonic, or ultrasonic frequency, e.g. for performing mechanical work in general4%
C08LCompositions of macromolecular compounds4%
E21BEarth or rock drilling4%
PatentTitleYear
10,310,376Resist composition, pattern forming process, polymer, and monomer201910,248,022Sulfonium compound, making method, resist composition, and pattern forming process201910,180,626Sulfonium salt, resist composition, and patterning process201910,173,975Sulfonium compound, resist composition, and pattern forming process201910,025,180Sulfonium compound, resist composition, and patterning process20189,740,100'Hemiacetal compound, polymer, resist composition, and patterning process'20179,703,193'Onium salt, resist composition, and patterning process'20179,458,144'Monomer, polymer, resist composition, and patterning process'20169,256,127'Monomer, polymer, resist composition, and patterning process'20169,223,205'Acid generator, chemically amplified resist composition, and patterning process'20159,221,742'Sulfonium salt, chemically amplified resist composition, and pattern forming process'20158,871,427'Positive resist composition and patterning process'20148,795,942'Positive resist composition and patterning process'20148,748,076'Resist composition and patterning process using the same'20148,703,384'Positive resist composition and patterning process'20148,628,908'Chemically amplified resist composition and patterning process'20147,727,704'Positive resist compositions and patterning process'20107,691,561'Positive resist compositions and patterning process'20107,167,579'Method and apparatus for determining the sex of a fertilized egg'20076,804,875'Method of mounting elastic wave generator'20046,272,916'Acoustic wave transmission system and method for transmitting an acoustic wave to a drilling metal tubular member'20016,202,490'Nondestructive testing apparatus'20015,769,173'Vibration exciter machine'19985,675,325'Information transmitting apparatus using tube body'19975,612,495'Non-destructive examination device'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2004Patents assigned to MITSUBISHI ELECTRIC CORP (6)· patent assignee history
1997–2004Based in Tokyo, JP· patent location history
1997–2007Based in Nagasaki, JP· patent location history
2010–2019Patents assigned to SHINETSU CHEMICAL CO (18)· patent assignee history
2010–2019Based in Joetsu-shi, JP· patent location history
2014Patents assigned to TANIGUCHI RYOSUKE (5)· patent assignee history
2014Patents assigned to KOBAYASHI TOMOHIRO (4)· patent assignee history
2014Patents assigned to OHSAWA YOUICHI (3)· patent assignee history
2014–2015Based in Jyoetsu, JP· patent location history
2014Based in Niigata, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO182010–2019
MITSUBISHI ELECTRIC CORP61997–2004
TANIGUCHI RYOSUKEself52014
KOBAYASHI TOMOHIRO42014
OHSAWA YOUICHI32014
Locations
LocationPatentsSpan
Joetsu-shi, JP142010–2019
Tokyo, JP41997–2004
Jyoetsu, JP32014–2015
Nagasaki, JP31997–2007
Niigata, JP12014