Inventor

Takahisa Shiozawa

Inventor

Utsunomiya, JP

Overview

22→

Patents

1990–2010

Patent span

Physics

Primary field (CPC G)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices66%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them13%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%

G02BOptical elements, systems or apparatus6%

B41JTypewriters3%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%

PatentTitleYear

7,760,330'Illumination optical system and exposure apparatus'2010 7,671,967'Exposure apparatus and exposure method'2010 7,468,781'Exposure apparatus'2008 7,345,741'Illumination optical system and exposure apparatus'2008 7,286,206'Exposure apparatus'2007 7,142,283'Exposure apparatus'2006 6,897,944'Illumination optical system, exposure method and apparatus using the same'2005 6,757,050'Exposure method and apparatus for detecting an exposure amount and for calculating a correction value based on the detected exposure amount'2004 6,636,295'Exposure apparatus and device manufacturing method'2003 5,892,573'Exposure apparatus and method with multiple light receiving means'1999 5,726,740'Projection exposure apparatus having illumination device with ring-like or spot-like light source'1998 5,719,617'Illumination system for superposing light beams one upon another on a surface using a projecting system having different focal point positions'1998 5,699,148'Exposure apparatus and microdevice manufacturing method using the same'1997 5,684,567'Exposure apparatus and device manufacturing method for projecting light from a secondary light source onto a mask or pattern'1997 5,621,499'Scanning exposure apparatus'1997 5,491,534'Exposure apparatus and microdevice manufacturing method using the same'1996 5,475,491'Exposure apparatus'1995 5,459,547'Illumination device'1995 5,345,292'Illumination device for projection exposure apparatus'1994 5,140,366'Exposure apparatus with a function for controlling alignment by use of latent images'1992 5,121,160'Exposure method and apparatus'1992 4,974,919'Illuminating device'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–2010Patents assigned to CANON KK (22)· patent assignee history

1990–1995Based in Yokohama, JP· patent location history

1994–1998Based in Kawasaki, JP· patent location history

1996–2004Based in Utsunomiya, JP· patent location history

2005–2010Based in Tochigi, JP· patent location history

2010Based in Kawachi-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	22	1990–2010

Locations

Location	Patents	Span
Utsunomiya, JP	7	1996–2004
Tochigi, JP	6	2005–2010
Kawasaki, JP	4	1994–1998
Yokohama, JP	4	1990–1995
Kawachi-gun, JP	1	2010