Inventor
Hiroshi Yanazawa
Inventor
Tokyo, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests22%
H10DInorganic electric semiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
PatentTitleYear
4,902,635'Method for production of compound semicondutor devices'19904,614,706'Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching'19864,536,421'Method of forming a microscopic pattern'19854,321,104'Photoetching method'19823,942,982'Method for controlling the degree of side-etch in thin oxide films by photo-etching process'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1986Patents assigned to HITACHI LTD (4)· patent assignee history
1976–1986Based in Tokyo, JP· patent location history
1982Based in Hinode, JP· patent location history
1990Patents assigned to AGENCY IND SCIENCE TECHN (1)· patent assignee history
1990Based in Kokubunji, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 4 | 1976–1986 |
| AGENCY IND SCIENCE TECHN | 1 | 1990 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 3 | 1976–1986 |
| Kokubunji, JP | 1 | 1990 |
| Hinode, JP | 1 | 1982 |