LexDanaLexDanabeta
Inventor

HUI GWAN LEE

Inventor
KR

Overview

3→
Patents
2023–2025
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B25Jprimary
B25JManipulators33%
G05BControl or regulating systems in general33%
B24BMachines, devices, or processes for grinding or polishing17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
12,233,560Automated gas supply system202511,904,480Automated gas supply system202411,577,364Conditioner and chemical mechanical polishing apparatus including the same2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to SAMSUNG ELECTRONICS CO LTD (3)· patent assignee history
2023–2025Based in KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD32023–2025
Locations
LocationPatentsSpan
KR32023–2025