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Inventor

John C. Fournier

Inventor
Depew, NY, US

Overview

8→
Patents
1997–2004
Patent span
Physics
Primary field (CPC G)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography55%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables27%
G01FMeasuring volume, volume flow, mass flow or liquid level18%
PatentTitleYear
6,731,885'Capacitive probe toner level detector assembly'20046,670,817'Capacitive toner level detection'20036,435,024'Method and apparatus for determining the level of particulate material in a particulate material collection vessel'20026,405,016'Developer material collection bottle'20026,153,888'Automatic control of reflective-type sensors in reproduction apparatus'20005,852,761'Motorized wick for fusing apparatus'19985,805,292'Control system for automatic intensity adjustment of light emitters of a sheet sensor device'19985,660,385'Apparatus for diverting a photocopying medium in photocopies'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–1998Patents assigned to EASTMAN KODAK CO (3)· patent assignee history
1997–2002Based in Depew, NY, US· patent location history
1998–2000Based in Rochester, NY, US· patent location history
2002–2004Patents assigned to HEIDELBERGER DRUCKMASCH AG (3)· patent assignee history
2002Patents assigned to NEXPRESS SOLUTIONS LLC (1)· patent assignee history
2002Based in Lancaster, NY, US· patent location history
2003–2004Based in Bowmansville, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EASTMAN KODAK CO31997–1998
HEIDELBERGER DRUCKMASCH AG32002–2004
NEXPRESS SOLUTIONS LLC12002
Locations
LocationPatentsSpan
Depew, New York, US31997–2002
Bowmansville, New York, US22003–2004
Rochester, New York, US21998–2000
Lancaster, New York, US12002