Inventor
Tsutomu Shibuya
Inventor
Hadano, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Kprimary
H05KPrinted circuits18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
Y02PClimate change mitigation technologies in the production or processing of goods18%
Y10TTechnical subjects covered by former us classification18%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes6%
G07CTime or attendance registers6%
PatentTitleYear
8,059,863'Work movement analysis method, work movement analysis apparatus, and work movement analysis program'20116,423,405'Surface reformation method of high polymer material'20026,017,424'Laser assisted surface reformation method of high polymer material'20005,801,350'Surface reformation method of high polymer material'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2011Patents assigned to HITACHI LTD (4)· patent assignee history
1998–2011Based in Hadano, JP· patent location history
2011Patents assigned to FUJIMORI SHIGERU (1)· patent assignee history
2011Patents assigned to OTA MITSUHIRO (1)· patent assignee history
2011Patents assigned to SESHIMO TOSHIAKI (1)· patent assignee history
2011Patents assigned to SHIBUYA TSUTOMU (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 4 | 1998–2011 |
| FUJIMORI SHIGERU | 1 | 2011 |
| OTA MITSUHIRO | 1 | 2011 |
| SESHIMO TOSHIAKI | 1 | 2011 |
| SHIBUYA TSUTOMUself | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hadano, JP | 4 | 1998–2011 |